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2015
DOI: 10.1063/1.4934873
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Generation of neutral atomic beams utilizing photodetachment by high power diode laser stacks

Abstract: We demonstrate the use of high power diode laser stacks to photodetach fast hydrogen and carbon anions and produce ground term neutral atomic beams. We achieve photodetachment efficiencies of ∼7.4% for H(-) at a beam energy of 10 keV and ∼3.7% for C(-) at 28 keV. The diode laser systems used here operate at 975 nm and 808 nm, respectively, and provide high continuous power levels of up to 2 kW, without the need of additional enhancements like optical cavities. The alignment of the beams is straightforward and … Show more

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Cited by 16 publications
(8 citation statements)
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“…Installation of additional experimental equipment at the CSR is already foreseen. A high-power diode-laser interaction region, similar to that realized in recent work 28 , is in preparation for producing a fast beam of neutral atoms merging with the stored ions along a straight section of the CSR (see Sec. II).…”
Section: Discussionmentioning
confidence: 99%
“…Installation of additional experimental equipment at the CSR is already foreseen. A high-power diode-laser interaction region, similar to that realized in recent work 28 , is in preparation for producing a fast beam of neutral atoms merging with the stored ions along a straight section of the CSR (see Sec. II).…”
Section: Discussionmentioning
confidence: 99%
“…The neutral beam is generated by a laser-induced electron detachment of a negative ion beam [7]. Two different ion sources, the duoplasmatron and the cesium sputter ion sources, were installed on the beamline at Rikkyo University for the off-line testing (Fig.…”
Section: Negative Ion Sourcementioning
confidence: 99%
“…We have previously used this technique to produce beams of neutral atomic H and D for studies of associative detachment (Bruhns et al 2010a(Bruhns et al , 2010bMiller et al 2011Miller et al , 2012. Additional details can be found in O'Connor et al (2015a).…”
Section: Neutral Beammentioning
confidence: 99%