Generation of imprinted strain gradients for spintronics

Abstract

In this work, we propose and evaluate an inexpensive and CMOS-compatible method to locally apply strain on a Si/SiOx substrate. Due to high growth temperatures and different thermal expansion coefficients, a SiN passivation layer exerts a compressive stress when deposited on a commercial silicon wafer. Removing selected areas of the passivation layer alters the strain on the micrometer range, leading to changes in the local magnetic anisotropy of a magnetic material through magnetoelastic interactions. Using Kerr microscopy, we experimentally demonstrate how the magnetoelastic energy landscape, created by a pair of openings, enables in a magnetic nanowire the creation of pinning sites for in-plane vortex walls that propagate in a magnetic racetrack. We report substantial pinning fields up to 15 mT for device-relevant ferromagnetic materials with positive magnetostriction. We support our experimental results with finite element simulations for the induced strain, micromagnetic simulations, and 1D model calculations using the realistic strain profile to identify the depinning mechanism. All the observations above are due to the magnetoelastic energy contribution in the system, which creates local energy minima for the domain wall at the desired location. By controlling domain walls with strain, we realize the prototype of a true power-on magnetic sensor that can measure discrete magnetic fields or Oersted currents. This utilizes a technology that does not require piezoelectric substrates or high-resolution lithography, thus enabling wafer-level production.

Micromagnetic modeling of magnetization processes and magnetoelastic interactions

“…The behavior observed in this work was attributed to the local strain gradients that take place due to the openings in the Si/SiOx substrate. This gradients compete with the magnetic field, leading to pin or modify the DW velocity [206].…”