2007
DOI: 10.1063/1.2778464
|View full text |Cite
|
Sign up to set email alerts
|

Generation of high-quality lines and arrays using nanoparticle controlling processes

Abstract: Articles you may be interested inHigh-speed camera observation of solution plasma during nanoparticles formation Appl. Phys. Lett. 104, 083104 (2014); 10.1063/1.4865498 Nanogranular structures formed by combinatorial control processing of size-selected metal nanoparticles Nearfield surface enhanced spectroscopy using targeted nanoparticle deposition Appl. Phys. Lett. 92, 123101 (2008); 10.1063/1.2891085High resolution selective multilayer laser processing by nanosecond laser ablation of metal nanoparticle films Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3

Citation Types

0
3
0

Year Published

2008
2008
2018
2018

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 9 publications
(3 citation statements)
references
References 15 publications
0
3
0
Order By: Relevance
“…Spin-coating, drop-casting, and dip-coating are all common techniques for depositing colloidal NCs such as CdSe and PbSe [7][8][9]. Large areas can be covered with roll-to-roll printing, and recent work has demonstrated that small features can be patterned with conventional photolithography [10] or new lithographic techniques in which functionalized NCs themselves take on the role of the resist [11][12][13].…”
Section: Introductionmentioning
confidence: 99%
“…Spin-coating, drop-casting, and dip-coating are all common techniques for depositing colloidal NCs such as CdSe and PbSe [7][8][9]. Large areas can be covered with roll-to-roll printing, and recent work has demonstrated that small features can be patterned with conventional photolithography [10] or new lithographic techniques in which functionalized NCs themselves take on the role of the resist [11][12][13].…”
Section: Introductionmentioning
confidence: 99%
“…Hence, stabilizing the turbulence to create homogeneity in the microparticle deposition becomes an important issue. Although several studies have discussed how to pattern the microparticle deposition [ 5 , 7 , 8 , 9 , 10 , 26 , 27 ], stabilizing the aerosol turbulence for homogeneous microparticle deposition has not yet been fully investigated.…”
Section: Introductionmentioning
confidence: 99%
“…14,15) The combination of lithographic and NP fabrication techniques is very useful in the manufacture of NP devices and sensors. Various nanopatterning methods based on lithographic techniques such as electron beam (EB) lithography, [16][17][18][19][20] nanoimprint lithography, 21) focused ion beam lithography, 22) nanosphere lithography, [23][24][25][26] and block copolymer lithography 27) have been used to control the shape, size, and interparticle distance. Kuwabata and coworkers have reported direct patterning and Ag deposition by a lithographic technique using ionic liquid.…”
Section: Introductionmentioning
confidence: 99%