Generalized ellipsometry of artificially designed line width roughness

Spectroscopic ellipsometry for active nano- and meta-materials

“…This trend may be even more reinforced by the development of still better systems and computing tools for data acquisition and treatment. Based on these developments, accurate characterization of structured surfaces based on the combination of Mueller matrix SE [176,177], with scatterometry [178], scattero metry SE [179], other nondestructive/noncontact characterization techniques [180], and numerical calculations [181] is to be foreseen.…”

Sidewall roughness in nanolithography: origins, metrology and device effects

“…Other approaches employ dark-fi eld scatterometry, ellipsometry, angular resolved scatterometry, etc. (Brill et al ., 2010;Foldyna et al ., 2011;Shyu et al ., 2007). Modeling studies have also been performed, testing new techniques in simulating the effects of LER on scattered light such as the fi eld-stitching method (Schuster et al ., 2009).…”

Advances in Optical and Magnetooptical Scatterometry of Periodically Ordered Nanostructured Arrays

“…Unlike generalized ellipsometry, the Mueller matrix polarimetry works not only with cross-polarization effects, but also can detect the depolarization effects caused by surface roughness or LER and LWR. Foldyna et al [43] demonstrated the application of this method to monitor the LWR.…”