2016
DOI: 10.1088/0957-4484/27/12/125703
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General route for the decomposition of InAs quantum dots during the capping process

Abstract: The effect of the capping process on the morphology of InAs/GaAs quantum dots (QDs) by using different GaAs-based capping layers (CLs), ranging from strain reduction layers to strain compensating layers, has been studied by transmission microscopic techniques. For this, we have measured simultaneously the height and diameter in buried and uncapped QDs covering populations of hundreds of QDs that are statistically reliable. First, the uncapped QD population evolves in all cases from a pyramidal shape into a mor… Show more

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Cited by 23 publications
(17 citation statements)
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“…Two activation-energy components are apparent. The first component of approximately 20 meV corresponds to the energy difference between the QD ESs based on the three-dimensional quantum simulations, where the QD diameter determined by AFM analysis [44] and the nonuniform In composition inside the QD [45] are taken into account (see the Supplemental Material [35]); these simulations are performed using the nextnano commercial software [46]. Thermal excitation of the electrons induced PL quenching due to the decrease in the radiative recombination efficiency, which is attributed to the weakened overlap of the electron and hole wave functions.…”
Section: Resultsmentioning
confidence: 99%
“…Two activation-energy components are apparent. The first component of approximately 20 meV corresponds to the energy difference between the QD ESs based on the three-dimensional quantum simulations, where the QD diameter determined by AFM analysis [44] and the nonuniform In composition inside the QD [45] are taken into account (see the Supplemental Material [35]); these simulations are performed using the nextnano commercial software [46]. Thermal excitation of the electrons induced PL quenching due to the decrease in the radiative recombination efficiency, which is attributed to the weakened overlap of the electron and hole wave functions.…”
Section: Resultsmentioning
confidence: 99%
“…Thus, the WL of the CL5 layer only keeps an amount of In equivalent to 1.1 MLs of InAs compared to the initial 2.8 MLs deposited. Remarkably, this reduction of the WL is stronger than in other capping strategies such as the use of strain-reducing layers (SRL) or increased GaAs CL growth rate [34,50]. On the one hand, the amount of InAs in the WL after accelerating the growth rate of the GaAs CL to 2 ML/s is 1.7 MLs of InAs, but no substantial improvement is expected for faster growth [46,51].…”
Section: Wl Reductionmentioning
confidence: 98%
“…Since for this growth rate the decomposition process is completely suppressed, this should be the thinnest WL layer achievable with our approach. The effect of the GaAs capping rate on the WL morphology has been recently confirmed by other techniques [8], [15]. A thinner WL should result in larger confinement energy and, therefore, reduced potential barriers for electrons and holes.…”
Section: Effect Of Capping Rate On Wl Thicknessmentioning
confidence: 69%