2009
DOI: 10.1088/1742-6596/182/1/012029
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General aspects of solid on liquid growth mechanisms

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Cited by 3 publications
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“…The authors describe an initial nucleation and subsequent formation of bigger aggregates due to film-forming material randomly diffusing across the liquid’s surface [ 40 , 41 , 42 ]. Whether the precursor material arriving at the liquid substrate forms floating clusters or submerges into the liquid depends on the intermolecular forces predominating gravitational effects [ 27 , 41 , 42 , 43 ]. In accordance with the deposition of metal films, the occurrence of internal film stress and resulting wrinkling has been described for plasma-enhanced chemical vapor deposition (PECVD) processes which have been applied using monomers, such as ethylene, methane, hexamethyldisiloxane (HMDSO), silane or a mixture of carbon tetrafluoride and argon, to deposit closed films on liquids [ 27 , 43 ].…”
Section: Introductionmentioning
confidence: 99%
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“…The authors describe an initial nucleation and subsequent formation of bigger aggregates due to film-forming material randomly diffusing across the liquid’s surface [ 40 , 41 , 42 ]. Whether the precursor material arriving at the liquid substrate forms floating clusters or submerges into the liquid depends on the intermolecular forces predominating gravitational effects [ 27 , 41 , 42 , 43 ]. In accordance with the deposition of metal films, the occurrence of internal film stress and resulting wrinkling has been described for plasma-enhanced chemical vapor deposition (PECVD) processes which have been applied using monomers, such as ethylene, methane, hexamethyldisiloxane (HMDSO), silane or a mixture of carbon tetrafluoride and argon, to deposit closed films on liquids [ 27 , 43 ].…”
Section: Introductionmentioning
confidence: 99%
“…Whether the precursor material arriving at the liquid substrate forms floating clusters or submerges into the liquid depends on the intermolecular forces predominating gravitational effects [ 27 , 41 , 42 , 43 ]. In accordance with the deposition of metal films, the occurrence of internal film stress and resulting wrinkling has been described for plasma-enhanced chemical vapor deposition (PECVD) processes which have been applied using monomers, such as ethylene, methane, hexamethyldisiloxane (HMDSO), silane or a mixture of carbon tetrafluoride and argon, to deposit closed films on liquids [ 27 , 43 ]. If non-film-forming process gases such as argon and hydrogen are used for the plasma treatment of liquids, such as PDMS, the liquid’s surface gets cross-linked and solidified.…”
Section: Introductionmentioning
confidence: 99%
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“…Depositing solid materials on liquids is a promising approach in many fields and can be conducted by using a variety of methods, substrates, and precursors . Low‐pressure deposition processes have successfully been used to deposit metallic, polymeric, and silicone‐like films onto liquids . These methods show promising potential for various applications like the encapsulation of liquids, the production of microstructures, and the fabrication of membranes …”
Section: Introductionmentioning
confidence: 99%