2004
DOI: 10.1002/sia.1664
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Ge molecular beam epitaxy on Si(113): surface structures, nanowires and nanodots

Abstract: By performing epitaxial growth of Ge on Si(113) layer by layer, observed using scanning tunnelling microscopy, we show the Ge/Si(113) surface structure and island shape transition with an increase of Ge coverage and we discuss the transition in terms of epitaxial stress evolution and relaxation of the epitaxial morphologies. Nanofeatures of Ge epitaxial islands, such as nanowires and nanodots, are highlighted.

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Cited by 7 publications
(9 citation statements)
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“…The surface structure is the 2×n (n = 2, 3) phase, which corresponds to previous research [19,22]. One-dimensional islands that grow toward the [1][2][3][4][5][6][7][8][9][10] direction are observed locally [black arrow in Fig. 2(a)].…”
Section: Experimental and Calculation Methodssupporting
confidence: 73%
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“…The surface structure is the 2×n (n = 2, 3) phase, which corresponds to previous research [19,22]. One-dimensional islands that grow toward the [1][2][3][4][5][6][7][8][9][10] direction are observed locally [black arrow in Fig. 2(a)].…”
Section: Experimental and Calculation Methodssupporting
confidence: 73%
“…3(a), three types of protrusion (defined as α, β, and γ protrusions) are observed in the 2×2 phase (defined as 2×2:H structure). The α and γ protrusions are ball-shaped, and the interval is 0.38 nm toward the [1][2][3][4][5][6][7][8][9][10] direction. The β protrusion is elliptical, and the interval is 0.80 nm toward the [1][2][3][4][5][6][7][8][9][10] direction.…”
Section: Resultsmentioning
confidence: 99%
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“…For this reason, the 1D growths reported on Si(1 1 3) [14,15] may be based on the intrinsic anisotropy of the unreconstructed Si(1 1 3)1 · 1 structure rather than one of the reconstructed 3 · 2 structure.…”
Section: Introductionmentioning
confidence: 90%