2010
DOI: 10.1380/ejssnt.2010.221
|View full text |Cite
|
Sign up to set email alerts
|

Ge Growth on Partially and Entirely Ag Covered Si(111)

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2014
2014
2020
2020

Publication Types

Select...
3
1
1

Relationship

0
5

Authors

Journals

citations
Cited by 5 publications
(1 citation statement)
references
References 28 publications
(30 reference statements)
0
1
0
Order By: Relevance
“…The dynamics of the deposition process are complex, measurements are noisy and slow, and disturbances due to contamination and drift limits the repeatability of the material properties that determine device performance [102]. Simultaneous deposition of different types of atoms is widely encountered in experiments and practical applications [103,104,105,106,107]. The deposition processes can control the structural evolution of the growth surface and can be modelled using the KMC method.…”
Section: Chapter 4 Deposition and Growth Kmcmentioning
confidence: 99%
“…The dynamics of the deposition process are complex, measurements are noisy and slow, and disturbances due to contamination and drift limits the repeatability of the material properties that determine device performance [102]. Simultaneous deposition of different types of atoms is widely encountered in experiments and practical applications [103,104,105,106,107]. The deposition processes can control the structural evolution of the growth surface and can be modelled using the KMC method.…”
Section: Chapter 4 Deposition and Growth Kmcmentioning
confidence: 99%