1998
DOI: 10.1557/proc-527-429
|View full text |Cite
|
Sign up to set email alerts
|

Ge Diffusion in SnTe Crystal

Abstract: This work is devoted to the study of Ge diffusion in crystalline Sn1-δTe1+8 with δ=0.0065±0.0008 in temperature range T=878-973 K by electron probe microanalysis and layer by layer X-ray analysis. For the latter lattice constant dependence on composition was determined: a(Å)=a(SnTe)-(0.368±0.008)× where 0<×<0. 1. Activation energy was found to be about 1.3 eV, much less than in the case of Ge diffusion in PbTe.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Year Published

2012
2012
2012
2012

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
references
References 5 publications
0
0
0
Order By: Relevance