2000
DOI: 10.1002/1096-9918(200012)29:12<887::aid-sia942>3.0.co;2-x
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GDOES depth profiling analysis and cross-sectional transmission electron microscopy of a hard disk

Abstract: Through the analysis of a commercial hard disk, it is demonstrated that glow discharge optical emission spectroscopy (GDOES) is a powerful technique for depth profiling analysis of surfaces coated with multilayers of widely differing thicknesses, ranging from a few tens of nanometres to several tens of microns. This arises from its high depth resolution, resulting from highly uniform sputtering, and its wide thickness range, resulting from its high sputtering rate. The depth profile obtained agreed precisely w… Show more

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Cited by 9 publications
(4 citation statements)
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References 9 publications
(12 reference statements)
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“…Indeed, the highly uniform sputtering rate yields an excellent depth resolution, enabling the analysis of very thin films. On the other hand, the high sputtering rates typical for GD-OES allow thick films to be analyzed, within a reasonable time (170). The depth resolution and sensitivity were found to be comparable to, or better than, secondary ion mass spectrometry (SIMS).…”
Section: Glow Discharge Atomic Spectrometrymentioning
confidence: 94%
“…Indeed, the highly uniform sputtering rate yields an excellent depth resolution, enabling the analysis of very thin films. On the other hand, the high sputtering rates typical for GD-OES allow thick films to be analyzed, within a reasonable time (170). The depth resolution and sensitivity were found to be comparable to, or better than, secondary ion mass spectrometry (SIMS).…”
Section: Glow Discharge Atomic Spectrometrymentioning
confidence: 94%
“…Степень обогащения медью интерфейсов анодированных пленок бинарных сплавов Al−Cu в зависимости от технологических параметров процесса исследована в [14,15]. Применение GDOES для качественного и количественного анализа состава покрытий жестких магнитных дисков описано в [16,17].…”
Section: Introductionunclassified
“…2,7-9 Shimizu et al illustrated the basic potential for rf-GD-OES analysis of aluminium hard disks. 2,8 In their study, the latent elements from the treatment of aluminium substrate (Zn, Fe and N) were found at the Ni-P/Al interface. The depth profile revealed each of the different coating materials on top of the Ni-P layer, which was consistent with transmission electron microscopy (TEM) images.…”
Section: Introductionmentioning
confidence: 99%
“…Studies to date have been more demonstrative in nature than developments of suitable analytical methodologies. 2,[7][8][9] In this study, a detailed parametric evaluation of rf-GD-OES conditions was performed on Ni-P plated aluminium disks used as substrates for the fabrication of computer storage media. The evaluation included determination of the effects of discharge parameters (i.e., power and argon pressure) on the resultant profile characteristics, including temporal behavior and elemental response factors.…”
Section: Introductionmentioning
confidence: 99%