2011
DOI: 10.4028/www.scientific.net/amr.403-408.24
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GDA and ToF_SIMS of Plasma Carburizing Layer on Pure Titanium with Hydrogen-Free

Abstract: A triple-cathode plasma surface alloying technology has been invented, which has been used to carburize on a surface of pure titanium in an operation of hydrogen-free. A plasma carburized layer has been obtained on a sample of pure titanium, which features were examined with GDA and ToF_SIMS. The result is pointed that this kind of carburized layer possesses some special and interesting characteristics.

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“…As a result of double-glow plasma carburizing of the Ti2AlNb orthorhombic alloy, the layer of 40 µm with a hardness of 1051 HV and decreasing carbon content develops [77]. Also plasma carburizing of pure titanium in hydrogen free atmosphere is capable of creating the superficial carburized layer with special characteristics [78]. Of novel applications, carburizing of silicon is portrayed as an inexpensive in situ method of forming graphene on silicon wafer [79].…”
Section: Carburizingmentioning
confidence: 99%
“…As a result of double-glow plasma carburizing of the Ti2AlNb orthorhombic alloy, the layer of 40 µm with a hardness of 1051 HV and decreasing carbon content develops [77]. Also plasma carburizing of pure titanium in hydrogen free atmosphere is capable of creating the superficial carburized layer with special characteristics [78]. Of novel applications, carburizing of silicon is portrayed as an inexpensive in situ method of forming graphene on silicon wafer [79].…”
Section: Carburizingmentioning
confidence: 99%