2018
DOI: 10.1021/acsami.7b18242
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Gate-Tunable WSe2/SnSe2 Backward Diode with Ultrahigh-Reverse Rectification Ratio

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Cited by 67 publications
(56 citation statements)
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“…The reverse rectification ratio of WSe2/PtS2 is over 10 8 . Compared to conventional semiconductors-based backward diodes, vdW tunneling diodes exhibit a higher rectification ratio and show great potential in high-speed and low-power devices 806,807 . On the other hand, Wu et al designed a unilateral depletion structure based on AsP and MoS2.…”
Section: Neuromorphic Computingmentioning
confidence: 99%
“…The reverse rectification ratio of WSe2/PtS2 is over 10 8 . Compared to conventional semiconductors-based backward diodes, vdW tunneling diodes exhibit a higher rectification ratio and show great potential in high-speed and low-power devices 806,807 . On the other hand, Wu et al designed a unilateral depletion structure based on AsP and MoS2.…”
Section: Neuromorphic Computingmentioning
confidence: 99%
“…Recent studies have already demonstrated the exciting potentials of 2D materials and vdWHs in nano-electronics applications, such as atomically thin transistors, 22,23 vertical field-effect transistors, 24 and optoelectronics applications, such as photodetectors 25 and light-emitting diodes. 26,27 Although it has been relatively straightforward to produce ultrathin 2D nanosheets from intrinsically layered materials using various synthetic approaches, it is considerably more difficult to grow highly anisotropic ultrathin nanosheets from non-layered materials due to their intrinsic three-dimensional lattice structure. Nonetheless, a few examples of 2D nanosheets of some nonlayered materials (such as ZnSe, 28 PbS 29 ) and heterostructures (such as CdS/MoS 2 , 30 PbS/MoS 2 31 ) have been reported recently.…”
Section: Introductionmentioning
confidence: 99%
“…In the range of ±1 V, the rectification ratio exceeds 10 2 , which is close to the rectification ratio of some 2D diodes with tunable gates. [28] After removing the gate voltage, the rectification ratio of the device does not disappear immediately (Figure 2c). As seen from the inset in Figure 2c, despite the absence of a gate voltage, the device still exhibits a high rectification ratio of ≈10 5 after 1 h. Compared with the applying gate voltage of 40 V, the rectification ratio of the device is improved by 10 3 orders of magnitude because when a forward gate voltage is applied, holes tunnel from the graphene layer into the WS 2 layer.…”
Section: Quasi-non-volatile Programmable Rectification Characteristicsmentioning
confidence: 98%