Gate-to-body tunneling current model for silicon-on-insulator MOSFETs

Abstract

A gate-to-body tunneling current model for silicon-on-insulator (SOI) devices is simulated. As verified by the measured data, the model, considering both gate voltage and drain voltage dependence as well as image force-induced barrier low effect, provides a better prediction of the tunneling current and gate-induced floating body effect than the BSIMSOI4 model. A delayed gate-induced floating body effect is also predicted by the model.