The technical breakthrough in synthesizing graphene by chemical vapor deposition methods (CVD) has opened up enormous opportunities for large-scale device applications. In order to improve the electrical properties of CVD graphene grown on copper (Cu-CVD graphene), recent efforts have focussed on increasing the grain size of such polycrystalline graphene films to 100 micrometers and larger. While an increase in grain size and hence, a decrease of grain boundary density is expected to greatly enhance the device performance, here we show that the charge mobility and sheet resistance of Cu-CVD graphene is already limited within a single grain. We find that the current high-temperature growth and wet transfer methods of CVD graphene result in quasi-periodic nanoripple arrays (NRAs).Electron-flexural phonon scattering in such partially suspended graphene devices introduces anisotropic charge transport and sets limits to both the highest possible charge mobility and lowest possible sheet resistance values. Our findings provide guidance for further improving the CVD graphene growth and transfer process.KEYWORDS CVD graphene, quasi-periodic nanoripple arrays, anisotropic, Charge transport, flexural phonon scattering, transparent electrodes, sheet resistance Graphene 1 is a promising material for many novel device applications such as ultrafast nanoelectronics, optoelectronics and flexible transparent electronics. [2][3][4][5] Cu-based CVD methods have now made wafer-scale graphene synthesis and transfer feasible both for single layer graphene 6,7 (SLG) and bilayer graphene (BLG). 8 This not only brings the commercial applications of graphene within reach, but also provides great advantages in introducing new substrates to enhance and engineer its electronic properties by tuning the substrate-induced screening 9-12 and substrate-induced strain. 13,14 Unlike CVD graphene growth on Ni, 15,16 Cu-CVD graphene growth has a rather weak interaction with the underlying Cu substrate, allowing CVD graphene to grow continuously crossing atomically flat terraces, step edges, and vertices without introducing significant defects. 17 Thus, by controlling pregrowth annealing 7 and fine tuning growth parameters, 18,19 it is now possible to synthesize CVD 3 graphene with sub-millimetre grain size. However, pre-growth annealing and CVD growth typically require high temperatures very close to the melting point of Cu at 1083 ºC. This leads to Cu surface reconstruction and local surface melting 17,20 during graphene growth, making high density Cu singlecrystal terraces and step edges ubiquitous surface features. Taking into account the negative thermal expansion coefficient of graphene, this leads to new surface corrugations in CVD graphene during the cool down process. 21 Previously grain boundaries have been identified as one of the limiting factors to degrade graphene quality. 22 While the heptagon and pentagon network 22,23 at grain boundaries does disrupt the sp 2 delocalization of π electrons in graphene, it remains to be se...