Gate and Contact Induced Drain Leakage at High Voltage Operation in DRAM : YE: Yield Enhancement/Learning

Sarkar, Ketaki; Lee, John; Simpson, W. Sparrow; Orf, Bryan; Treider, Laura A.; MacMahon, David; Hurt, Michael

doi:10.1109/asmc57536.2023.10121070

2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) 2023

DOI: 10.1109/asmc57536.2023.10121070

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Gate and Contact Induced Drain Leakage at High Voltage Operation in DRAM : YE: Yield Enhancement/Learning

Ketaki Sarkar

John Lee

W. Sparrow Simpson

et al.

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Gate and Contact Induced Drain Leakage at High Voltage Operation in DRAM : YE: Yield Enhancement/Learning

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