2000
DOI: 10.1007/bf03240761
|View full text |Cite
|
Sign up to set email alerts
|

Gasflusssputtern von dielektrischen und transparent leitfähigen Oxidschichten

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2001
2001
2013
2013

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 4 publications
0
1
0
Order By: Relevance
“…high deposition rate and high process pressure). [14][15][16][17] Based on these advantages, short process times can be realised. In Fig.…”
Section: Electrolyte Manufacturingmentioning
confidence: 99%
“…high deposition rate and high process pressure). [14][15][16][17] Based on these advantages, short process times can be realised. In Fig.…”
Section: Electrolyte Manufacturingmentioning
confidence: 99%