Gas analysis by infrared spectroscopy as a tool for electrical fault diagnostics in SF 6 insulated equipment

Heise, H. M.; Kurte, R.; Fischer, Peter; Klockow, D.; Janissek, Paulo Roberto

doi:10.1007/s002160050511

Cited by 62 publications

(37 citation statements)

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“…The reactor was evacuated to a low pressure ( 17,18 Quantification can be achieved if the reference spectra are available. Hence, effluent product species were introduced to an on-line Fourier transform infrared (FTIR) spectrometer (Bio-Rad, Model FTS-7) for identification and quantification.…”

Section: Methodsmentioning

confidence: 99%

Decomposition of 1,2‐dichloroethane in an RF plasma environment

Li¹,

Yang²,

Shih³

et al. 2003

J of Chemical Tech & Biotech

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A radio frequency (RF) plasma system has been used to decompose 1,2-dichloroethane (DCE). Final products were identified by a Fourier transform infrared (FTIR) spectrometer. The main products of DCE decomposition in O 2 /Ar plasma were CO 2 , CO, and HCl. Other minor chlorinated products were CCl 4 , C 2 HCl 3 , C 2 H 3 Cl, C 2 Cl 4 , CHCl 3 , C 2 HCl 5 , and COCl 2 . Nonchlorinated products were C 2 H 2 , C 2 H 4 , C 2 H 6 , and HCOOH. The plasma reactor with a brass electrode had a higher decomposition fraction of DCE [η C 2 H 4 Cl 2 , (C in − C out )/C in × 100%] than that obtained with other materials (Au, Ni, and Cr). Different electrode configurations (inner and outer) were also evaluated for the decomposition of DCE. Argon plus oxygen was found to be the most suitable carrier/auxiliary gas for DCE decomposition. In addition, operational parameters for DCE decomposition in RF plasma including concentration, operational pressure, and total gas flow rate were evaluated.

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Section: Methodsmentioning

confidence: 99%

Decomposition of 1,2‐dichloroethane in an RF plasma environment

Li¹,

Yang²,

Shih³

et al. 2003

J of Chemical Tech & Biotech

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“…The mole fraction of the product species was determined by comparing with the response of the peak height of standard gas at the same wavenumber. 13,14 However, the concentrations of SF 4 and S 2 F 10 were estimated from data of Heise et al 15 and Wilmshurst and Bernstern. 16 All unreacted F atoms were assumed to be converted into F 2 , 17 and the mole fraction of F 2 was determined using a mass balance.…”

Section: Discussionmentioning

confidence: 99%

Decomposition of SF₆in an RF Plasma Environment

Shih

Lee

Tsai

et al. 2002

Journal of the Air & Waste Management Association

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Sulfur hexafluoride (SF 6 )-contained gas is a common pollutant emitted during the etching process used in the semiconductor industry. This study demonstrated the application of radio-frequency (RF) plasma in the decomposition of SF 6 . The decomposition fraction of SF 6 [η SF6, (C in -C out )/C in × 100%] and the mole fraction profile of the products were investigated as functions of input power and feed O 2 /SF 6 ratio in an SiO 2 reactor. The species detected in both SF 6 /Ar and SF 6 /O 2 /

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“…Thus, these stable and characteristic compounds are systematically investigated in this work. [9][10][11] The main chemical reactions involved are as follows:…”

Section: A Mechanism Of Sf 6 Decomposition Under Partial Dischargementioning

confidence: 99%

Optical properties and decomposition mechanisms of SF6 at different partial discharge determined by infrared spectroscopy

Luo¹,

Han²,

Tang³

et al. 2018

AIP Advances

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Probing the decomposition products of Sulfur hexafluoride (SF6) under partial discharge provides important information for fault diagnosis of Gas Insulated Switchgear (GIS). Here, the effects of discharging time, gas pressure, and discharging voltage on SF6 decomposition products have been investigated by Fourier transform infrared (FTIR) spectroscopy. The infrared spectra of decomposition products such as CF4, SOF2, and SO2F2 have been obtained. It can be found that the CF4, SOF2, and SO2F2 concentrations increase over increased discharging time up to 96 hours. The SO2F2 concentration increases while the discharging voltage is raised from 20 kV to 46 kV, due to the rapid deceleration to the lower energy of electron capture and dissociative attachment. The SO2F2 concentration is reduced while the gas pressure is increased from 0.3 MPa to 0.4 MPa. The present results about the SF6 decomposition can be useful for electrical fault diagnosis.

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Gas analysis by infrared spectroscopy as a tool for electrical fault diagnostics in SF 6 insulated equipment

Cited by 62 publications

References 1 publication

Decomposition of 1,2‐dichloroethane in an RF plasma environment

Decomposition of 1,2‐dichloroethane in an RF plasma environment

Decomposition of SF₆in an RF Plasma Environment

Optical properties and decomposition mechanisms of SF6 at different partial discharge determined by infrared spectroscopy

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Gas analysis by infrared spectroscopy as a tool for electrical fault diagnostics in SF 6 insulated equipment

Cited by 62 publications

References 1 publication

Decomposition of 1,2‐dichloroethane in an RF plasma environment

Decomposition of 1,2‐dichloroethane in an RF plasma environment

Decomposition of SF6in an RF Plasma Environment

Optical properties and decomposition mechanisms of SF6 at different partial discharge determined by infrared spectroscopy

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Decomposition of SF₆in an RF Plasma Environment