2009
DOI: 10.1117/12.840796
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GaP single crystal layers grown on GaN by MOCVD

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“…Then, a 2 μm thick SiN x layer was deposited onto ITO layer. This was because the usual thickness (100-500 nm) [17] of a p-type GaN layer is inadequate for the fabrication of CESs. Also, SiN x has a refractive index similar to that of ITO, and is transparent over the entire visible wavelength range [18].…”
Section: Device Structure and Fabricationmentioning
confidence: 98%
“…Then, a 2 μm thick SiN x layer was deposited onto ITO layer. This was because the usual thickness (100-500 nm) [17] of a p-type GaN layer is inadequate for the fabrication of CESs. Also, SiN x has a refractive index similar to that of ITO, and is transparent over the entire visible wavelength range [18].…”
Section: Device Structure and Fabricationmentioning
confidence: 98%