2011
DOI: 10.1016/j.jcrysgro.2010.12.081
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GaN nanowire templates for the pendeoepitaxial coalescence overgrowth on Si(111) by molecular beam epitaxy

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Cited by 20 publications
(13 citation statements)
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“…Due to the wide range of conditions, the different NW samples exhibited incubation times between a few minutes and hours as well as different NW densities, average NW diameters, and coalescence degrees. Further details on the growth conditions can be found elsewhere (sample A [37], B1-B4 [43], B5-B7 [44], C [30], and D [45]).…”
Section: Methodsmentioning
confidence: 99%
“…Due to the wide range of conditions, the different NW samples exhibited incubation times between a few minutes and hours as well as different NW densities, average NW diameters, and coalescence degrees. Further details on the growth conditions can be found elsewhere (sample A [37], B1-B4 [43], B5-B7 [44], C [30], and D [45]).…”
Section: Methodsmentioning
confidence: 99%
“…For sample 1 (2), GaN NWs were subsequently grown for 3 h at a substrate temperature of 780 (820) • C and N rich conditions, resulting in NW arrays with an average length of 1.0 (1.6) µm. [10] High-resolution XRD measurements were performed at a temperature of 27 • C using a Panalytical X-Pert PRO in strain-free GaN. [12,13] Sample 1 exhibits a linewidth of 3.7 meV, more than twice larger than the one observed for sample 2 (1.6 meV).…”
Section: Methodsmentioning
confidence: 99%
“…16,17 Also, even during the growth stage, the gallium rate cannot be increased deliberately because this would eventually lead to an enhancement of radial growth, and the NW morphology would be lost. 38 …”
Section: Effects Of the Gallium Ratementioning
confidence: 99%