Abstract:The external quantum efficiency of red EL emission in
normalGaP
diodes is studied as a function of doping in the p layer. A standardized procedure is used, consisting of liquid phase epitaxial growth of an n layer, followed by similar growth of the p layer. It is found that efficiencies up to 1.4% result from optimizing the Zn and O additions to the p melt, but that efficiencies as high as 3.4% can be obtained if the p melts are compensated by the addition of Te. Arguments are presented showing that a residu… Show more
“…7 x 10 17 cm-3 as deduced from the extent of compensation of Zn acceptors when 0 is added. 11 This value being a factor of 2 higher than the maximum 0 concentration determined for SG crystals 5 suggests that the kinetics of LPE growth provide a more favorable distribu-tion coefficient for 0 incorporation and thus may allow for a higher concentration of Zn-o complexes which are the radiative centers for the red luminescence. i2 , 13 We also note that Auger mechanisms 14 ,15 and other nonradiative paths involving free holes are expected to be minimized in our structures owing to the low net acceptor concentration in the p-Iayers.…”
External quantum efficiencies η as high as 7.2% have been obtained for gallium phosphide red light emitting diodes. The p-n junctions were prepared using a p-on-n liquid phase epitaxy process in which the dopant levels significantly differ from those previously reported. Doping profiles for these junctions are compared with earlier n-on-p structures (η = 1–2%) and it is suggested that the observed high efficiencies result from (1) more efficient electron injection, (2) increased O concentration in the p-type layers which may result in a higher concentration of Zn–O complexes, and/or (3) fewer free holes in the p region contributing to nonradiative recombination.
“…7 x 10 17 cm-3 as deduced from the extent of compensation of Zn acceptors when 0 is added. 11 This value being a factor of 2 higher than the maximum 0 concentration determined for SG crystals 5 suggests that the kinetics of LPE growth provide a more favorable distribu-tion coefficient for 0 incorporation and thus may allow for a higher concentration of Zn-o complexes which are the radiative centers for the red luminescence. i2 , 13 We also note that Auger mechanisms 14 ,15 and other nonradiative paths involving free holes are expected to be minimized in our structures owing to the low net acceptor concentration in the p-Iayers.…”
External quantum efficiencies η as high as 7.2% have been obtained for gallium phosphide red light emitting diodes. The p-n junctions were prepared using a p-on-n liquid phase epitaxy process in which the dopant levels significantly differ from those previously reported. Doping profiles for these junctions are compared with earlier n-on-p structures (η = 1–2%) and it is suggested that the observed high efficiencies result from (1) more efficient electron injection, (2) increased O concentration in the p-type layers which may result in a higher concentration of Zn–O complexes, and/or (3) fewer free holes in the p region contributing to nonradiative recombination.
“…Manuscript submitted Aug. 9, 1971; revised manuscript received Dec. 13, 1971. This was RNP 250 presented at the Atlantic City Meeting of the Society, Oct. [4][5][6][7][8] 1970.…”
Section: Acknowledgmentsmentioning
confidence: 99%
“…However, the doping requirements for maximizing the efficiency by means of O additions (in the form of Ga203) are less well understood. In particular, in open-tube LPE "best" devices have been reported for 0.15 (7) and 0.4 a/o O (6). In sealed-tube growth (SG or LPE) maximum efficiencies have been found over a surprisingly wide range of O additions, specifically between 0.03 (2) and 1.05 a/o O (5).…”
mentioning
confidence: 99%
“…In the case of solution growth (SG) (2,3) and sealed-tube liquid-ph.ase epitaxy (LPE) (4,5), the concentration of Zn added to the Ga-GaP solutions by different investigators to maximize the electroluminescent or photoluminescent efficiency varies from 0.03 (5) to 0.14 a/o (atom per cent (4). Because of vaporization losses the Zn additions in open-tube LPE (6, 7) are higher [0.15 (7) to 0.20 a/o (6)]. At these Zn concentrations in the Ga-GaP solutions the resulting crystals are expected to contain (8) Zn at concentrations less than 10 TM cm -3 (at a typical growth temperature of ~1040~ hence, the deleterious effect of Auger recombination (9) on efficiency is avoided.…”
Coprecipitation of
β‐Ga2O3
has been observed in O‐doped
normalGaP
epitaxial films grown by liquid‐phase epitaxy under isothermal conditions at an average growth temperature of ∼1040°C. The coprecipitation seems to be independent of cooling rate and of the source of O [
Ga2O3
powder, bulk
Ga2O3
, or glassy
normalZnfalse(PO3)2
]. The coprecipitation of
β‐Ga2O3
could be prevented either by imposing a temperature gradient over the ampoule (to enhance vapor transport via
Ga2O
) or by reducing the amount of O added to the Ga‐rich solution in an isothermal system to
∼2.5×10−2 normala/normalo false(normalatom per centfalse)
. The latter result is interpreted as giving the solubility at ∼1040°C of
Ga2O3
in Ga saturated with
normalGaP
and is used to obtain an estimate of the eutectic valley in the ternary
normalGa‐P‐Ga2O3
system.
“…GaAszPi_" (11 Ga,27Ga,157Ga) SnTe Sulfide films GaN (85Ga) Te GaP (1 IGa,92Ga,162Ga) Ti Ge (4Ga,5Ga,47Ga,54Ga,67Ga,79Ga,TiO,TiN 84Ga,106Ga,164Ga,193Ga) Th on W( 100)…”
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