Gain-saturated 109 nm tabletop laser operating at 1 Hz repetition rate

Alessi, D.; Martz, Dale; Wang, Y; Berrill, M.; Luther, B. M.; Rocca, J. J.

doi:10.1364/ol.35.000414

Cited by 28 publications

(9 citation statements)

References 15 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…We envision that a grating with a smaller pitch size could be used for further reduction of period and feature size, and the grating with narrower slits could be used to get higher M sf values, more than M sf 5x. In addition, the utilization of recently developed EUV lasers in the vicinity of 13 nm can decrease further the feature size achievable with this patterning approach [27].…”

Section: (A)-3(c)]mentioning

confidence: 99%

Fractional Talbot lithography with extreme ultraviolet light

Kim

Danylyuk

et al. 2014

Opt. Lett.

View full text Add to dashboard Cite

Fractional Talbot effect leads to the possibility to implement patterning of structures with smaller periods than the master mask. This is particularly attractive when using short wavelength illumination in the extreme ultraviolet because of attainable resolution in the sub-100-nm range. In this Letter, we demonstrate the Talbot lithography with the fractional Talbot effect under coherent illumination generated with a capillary discharge Ne-like Ar extreme ultraviolet laser. Various spatial frequency multiplications up to 5x are achieved using a parent grating. This technique allows a fabrication of nanostructures with high-resolution patterns, which is of high interest in many applications such as the manufacturing of plasmonic surfaces and photonic devices.

show abstract

Section: (A)-3(c)]mentioning

confidence: 99%

Fractional Talbot lithography with extreme ultraviolet light

Kim

Danylyuk

et al. 2014

Opt. Lett.

View full text Add to dashboard Cite

show abstract

“…In the fourbucket technique [40,42], the phase shifts δ n are 0, π∕2, π, and 3π∕2, so the four corresponding intensities are obtained by the substitution of these values in Eq. (2). Operating with the four intensities, it is possible to get the spatial phase distribution in modulus 2π,…”

Section: Design Of the Interferometermentioning

confidence: 99%

“…The significant progress in the development of compact light sources with wavelengths in the extreme ultraviolet (EUV), covering the range of 10-50 nm [1,2], has fostered research in several fields that use short wavelengths. Some examples are the characterization and processing of materials [3][4][5][6]; techniques for high-resolution metrology [7][8][9][10][11]; studies in atomic physics, photochemistry, and photophysics [12,13]; biological imaging [14][15][16][17]; the diagnosis of very high-density plasmas [18][19][20][21]; the study of nonlinear phenomena [22,23]; and even integrated circuit lithography [24].…”

Section: Introductionmentioning

confidence: 99%

Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology

2014

View full text Add to dashboard Cite

The design of a phase-shift interferometer in the extreme ultraviolet (EUV) is described. The interferometer is expected to achieve a significantly higher precision as compared with similar instruments that utilize lasers in the visible range. The interferometer's design is specifically adapted for its utilization with a table top pulsed capillary discharge EUV laser. The numerical model evaluates the errors in the interferograms and in the retrieved wavefront induced by the shot-to-shot fluctuations and pointing instabilities of the laser.

show abstract

“…1(a)]. In the conventional implementations of grazing incidence pumping, where a parabolic or spherical mirror is used to focus the beam [3][4][5]9,10], the tilted target intercepts the short-pulse pump beam at different distances from the beam waist. This creates a ''butterfly'' shaped line focus on the target, which for small f-number systems, can deposit part of the pump energy outside the useful gain column, decreasing the gain.…”

Section: à2mentioning

confidence: 99%

“…Significant progress has been achieved in the past few years in the development of compact plasma-based soft-x-ray lasers [3][4][5][6][7][8][9][10]. However, repetitive operation of tabletop SXRLs has been limited to wavelengths above 10.9 nm [10]. At shorter wavelengths, the large pump energy required has limited the repetition rate to typically one shot per hour [11][12][13][14][15].…”

mentioning

confidence: 99%

Efficient Excitation of Gain-Saturated Sub-9-nm-Wavelength Tabletop Soft-X-Ray Lasers and Lasing Down to 7.36 nm

et al. 2011

Self Cite

View full text Add to dashboard Cite

We have demonstrated the efficient generation of sub-9-nm-wavelength picosecond laser pulses of microjoule energy at 1-Hz repetition rate with a tabletop laser. Gain-saturated lasing was obtained at ¼ 8:85 nm in nickel-like lanthanum ions excited by collisional electron-impact excitation in a precreated plasma column heated by a picosecond optical laser pulse of 4-J energy. Furthermore, isoelectronic scaling along the lanthanide series resulted in lasing at wavelengths as short as ¼ 7:36 nm. Simulations show that the collisionally broadened atomic transitions in these dense plasmas can support the amplification of subpicosecond soft-x-ray laser pulses. DOI: 10.1103/PhysRevX.1.021023 Subject Areas: Photonics, Plasma PhysicsThe high demand for bright soft-x-ray laser (SXRL) pulses greatly exceeds the beam time available at a few single-user free-electron laser facilities [1,2]. This motivates the development of more compact and widely accessible SXRLs for a broad range of experiments in small laboratory settings. Significant progress has been achieved in the past few years in the development of compact plasma-based soft-x-ray lasers [3][4][5][6][7][8][9][10]. However, repetitive operation of tabletop SXRLs has been limited to wavelengths above 10.9 nm [10]. At shorter wavelengths, the large pump energy required has limited the repetition rate to typically one shot per hour [11][12][13][14][15]. Soft-x-ray lasing at sub-10-nm wavelengths in lanthanide ions was first demonstrated using optical lasers of pump energy of several hundred joules [12,13]. Lasing in nickel-like lanthanum at ¼ 8:85 nm was later obtained by using 18-J pulses from a chirped-pulse-amplification (CPA) laser to achieve transient excitation, but with a gain-length product (g Â l ¼ 7:7) that remained insufficient to reach gain saturation [15]. Progress toward saturated lasing in this transition has been recently reported [16,17]. In turn, lasing at ¼ 7:36 nm in nickel-like Sm was initially demonstrated using 130-J pump pulses [12]. Later, gain saturation was reached using a picosecond-duration pump pulse with approximately 40 J of energy added to a prepulse of similar energy [14]. Also recently, the lasing threshold in this line was reached through the use of a total optical pump energy of 36 J [18]. However, the practical realization of highrepetition-rate tabletop lasers at sub-10-nm wavelengths requires obtaining gain-saturated lasing at significantly lower pump energies. We report the generation of gainsaturated picosecond SXRL pulses at ¼ 8:85 nm at 1-Hz repetition rate. The result is obtained by using a picosecond pump pulse with an unprecedentedly low energy of 4 J and a total optical pump energy of 7.5 J, that will make the operation at high-repetition rates possible. Furthermore, using the same pump energy, we observe lasing at wavelengths down to ¼ 7:36 nm in transitions of higher-Z nickel-like lanthanide ions, opening the prospect of practical gain-saturated tabletop lasers at shorter wavelengths. Modeling suggests that these dense-pl...

show abstract

Gain-saturated 109 nm tabletop laser operating at 1 Hz repetition rate

Cited by 28 publications

References 15 publications

Fractional Talbot lithography with extreme ultraviolet light

Fractional Talbot lithography with extreme ultraviolet light

Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology

Efficient Excitation of Gain-Saturated Sub-9-nm-Wavelength Tabletop Soft-X-Ray Lasers and Lasing Down to 7.36 nm

Contact Info

Product

Resources

About