2012
DOI: 10.1116/1.4746411
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Gain and loss mechanisms for neutral species in low pressure fluorocarbon plasmas by infrared spectroscopy

Abstract: A hydrocarbon reaction model for low temperature hydrogen plasmas and an application to the Joint European

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Cited by 4 publications
(3 citation statements)
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“…Since CF 4 formed a smaller percentage of the mixture, see table 9, we did not include the polymer deposition by CF x radicals. In addition to the F atom reactions, we added reactions of SF x radicals using the same reaction scheme as Kokkoris et al [294], see also comments on this work by Nelson et al [295].…”
Section: Eta Electron Total Attachmentmentioning
confidence: 99%
“…Since CF 4 formed a smaller percentage of the mixture, see table 9, we did not include the polymer deposition by CF x radicals. In addition to the F atom reactions, we added reactions of SF x radicals using the same reaction scheme as Kokkoris et al [294], see also comments on this work by Nelson et al [295].…”
Section: Eta Electron Total Attachmentmentioning
confidence: 99%
“…Since CF 4 formed a smaller percentage of the mixture, see Table 9, we did not include the polymer deposition by CF x radicals. In addition to the F atom reactions, we added reactions of SF x radicals using the same reaction scheme as Kokkoris et al [296], see also comments on this work by Nelson et al [297].…”
Section: Chemistry Construction and Validationmentioning
confidence: 99%
“…Gains can be limited to flow rate into the chamber, while losses can be confined to electron impact dissociation and the pump. 16 Gain and loss rates for c-C 4 F 8 can be calculated as…”
Section: C-c 4 Fmentioning
confidence: 99%