2011 37th IEEE Photovoltaic Specialists Conference 2011
DOI: 10.1109/pvsc.2011.6186489
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GaAs substrate misorientation and the effect on InAs quantum dot critical thickness

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Cited by 2 publications
(1 citation statement)
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“…QD growth parameters that led to improvements included the variation of temperature, chamber pressure, balancing the flow of the injector ports, and InAs deposition time. In addition, changes in wafer offcut resulted in an increased critical thickness for QD formation [15]. Figure 2(a) shows the 1 Â 1 mm AFM images from the edge to the center of the 4-in.…”
Section: Quantum Dot Growth and Characterization On 4-in Wafersmentioning
confidence: 99%
“…QD growth parameters that led to improvements included the variation of temperature, chamber pressure, balancing the flow of the injector ports, and InAs deposition time. In addition, changes in wafer offcut resulted in an increased critical thickness for QD formation [15]. Figure 2(a) shows the 1 Â 1 mm AFM images from the edge to the center of the 4-in.…”
Section: Quantum Dot Growth and Characterization On 4-in Wafersmentioning
confidence: 99%