2016
DOI: 10.1109/jphotov.2015.2493365
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GaAs0.75P0.25/Si Dual-Junction Solar Cells Grown by MBE and MOCVD

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Cited by 102 publications
(55 citation statements)
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“…12 Despite this high efficiency, monolithic two-terminal tandems represent arguably the most elegant tandem design but pose formidable challenges in terms of hetero-epitaxial material growth. [334][335][336][337][338] III-V/silicon tandem solar cells fabricated via growth of III-V layer stacks on epitaxial substrates combined with lift-off and layer transfer techniques have been demonstrated, but remain difficult to scale to large volume production. [339][340][341][342][343] However, a method for the growth of III-V layers on non-epitaxial substrates has recently been introduced that could change this situation.…”
Section: Outlook Beyond Single-junction Solar Cellsmentioning
confidence: 99%
“…12 Despite this high efficiency, monolithic two-terminal tandems represent arguably the most elegant tandem design but pose formidable challenges in terms of hetero-epitaxial material growth. [334][335][336][337][338] III-V/silicon tandem solar cells fabricated via growth of III-V layer stacks on epitaxial substrates combined with lift-off and layer transfer techniques have been demonstrated, but remain difficult to scale to large volume production. [339][340][341][342][343] However, a method for the growth of III-V layers on non-epitaxial substrates has recently been introduced that could change this situation.…”
Section: Outlook Beyond Single-junction Solar Cellsmentioning
confidence: 99%
“…[8] However, a relatively high threading dislocation density after lattice grading still limits the performance of III-V on Si solar cells. [9][10][11] Other issues such as the degradation of minority carrier lifetime in Si due to the overgrowth by metalorganic vapor-phase epitaxy (MOVPE) or molecular-beam epitaxy (MBE) have been studied intensively [12][13][14][15] and can be avoided today. One possibility is applying a SiN x diffusion barrier on the back side of the Si bottom cell to avoid in-diffusion of contaminants from the wafer carrier during high-temperature epitaxy.…”
Section: Introductionmentioning
confidence: 99%
“…Regarding highly efficient tandem absorber structures for solar energy conversion, group IV substrates are often preferred over III/V substrates: Germanium, for example, is more suitable as substrate used in the industry, when manufacturing standard triple‐junction solar cells, than GaAs, since the bandgap energy is lower and substrate costs are considerably cheaper. III/V‐on‐Si integration is considered to further reduce costs of solar cells, to increase efficiency, and is also desired for microelectronics . In contrast to III/V crystal structures, both Si and Ge substrates do only have covalent bonds between two atoms of the identical kind and are thus nonpolar lattice structures.…”
Section: Epitaxial Reference Surfacesmentioning
confidence: 99%