Abstract:It is shown that atomic hydrogen is an effective reagent for the extraction of CH3 groups from an adsorbed monolayer produced from trimethylgallium adsorption on SiO2. The reaction is first order in CH3 surface concentration and proceeds with zero activation energy in the 100 K temperature region. The efficiency for the extraction process is about 10−2 per atomic H collision with the surface. These results show that the Ga–CH3 bond may be broken by insertion of hydrogen atoms and that either CH3 or CH4 is elim… Show more
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