2022
DOI: 10.1585/pfr.17.1302094
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Fuzz Growth Process under He-W Co-Deposition Conditions

Abstract: Helium (He)-Tungsten (W) co-deposition experiments were conducted in the linear plasma device Co-NAGDIS at a temperature of 1223 K to observe the characteristics of fuzz growth on the W surface with auxiliary W deposition. The dependence on the deposition rate of W was investigated and a clear difference in fuzz thickness was found between He-only and co-deposition experiments. In addition, the fuzz structures on a single sample exhibited a spatially nonuniform distribution, which was probably caused by the no… Show more

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Cited by 4 publications
(3 citation statements)
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“…Adatom diffusion and epitaxial growth on fiber surfaces are probably related to the growth of LFNs 23 . However, no LFN growth occurred when the edges of the material were covered 25,26 . This was also the case with magnetron sputtering, where enhanced fuzzy layer growth was observed with auxiliary W deposition, but no LFN growth 27 .…”
Section: Introductionmentioning
confidence: 98%
“…Adatom diffusion and epitaxial growth on fiber surfaces are probably related to the growth of LFNs 23 . However, no LFN growth occurred when the edges of the material were covered 25,26 . This was also the case with magnetron sputtering, where enhanced fuzzy layer growth was observed with auxiliary W deposition, but no LFN growth 27 .…”
Section: Introductionmentioning
confidence: 98%
“…The formation of fuzz has been observed in many environments, i.e. linear plasma devices NAGDIS-II [5], PICIES-B [6], MAGNAM-PSI [7,8], and PSI-2 [9], large torus devices ASDEX Upgrade [10] and Large Helical Device (LHD) [11], and a magnetron sputtering [12]. Therefore, the formation of fuzz is a universal physical phenomenon caused by helium plasma irradiation.…”
Section: Introductionmentioning
confidence: 99%
“…Adatom diffusion and epitaxial growth on fiber surfaces are probably related to the growth of LFNs 32 . However, no LFN growth occurred when the edges of the material were covered 34,35 . This was also the case with magnetron sputtering, where enhanced fuzzy layer growth was observed with auxiliary W deposition, but there was no LFN growth 36 .…”
mentioning
confidence: 97%