1999 Symposium on VLSI Circuits. Digest of Papers (IEEE Cat. No.99CH36326)
DOI: 10.1109/vlsic.1999.797271
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Future perspective and scaling down roadmap for RF CMOS

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Cited by 34 publications
(22 citation statements)
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“…IMD of a MOSFET is primarily resulted from the nonlinearity of transconductance and output conductance in the saturation region [1][2][3]. When gate length [4] is shortened in order to obtain better power gain and cutoff frequency, linearity performance of MOSFETs will decrease [5]. In addition, linearity performance of a MOSFET can also be dependent on the device gate width [5].…”
Section: Introductionmentioning
confidence: 99%
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“…IMD of a MOSFET is primarily resulted from the nonlinearity of transconductance and output conductance in the saturation region [1][2][3]. When gate length [4] is shortened in order to obtain better power gain and cutoff frequency, linearity performance of MOSFETs will decrease [5]. In addition, linearity performance of a MOSFET can also be dependent on the device gate width [5].…”
Section: Introductionmentioning
confidence: 99%
“…When gate length [4] is shortened in order to obtain better power gain and cutoff frequency, linearity performance of MOSFETs will decrease [5]. In addition, linearity performance of a MOSFET can also be dependent on the device gate width [5]. Therefore, the device geometry is an important parameter for the RF characteristic analysis of the MOSFETs [4][5][6][7].…”
Section: Introductionmentioning
confidence: 99%
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“…The continuous advancement of CMOS technology has attracted tremendous interest in the field of wireless communication via the integration of high performance digital circuits and RF CMOS components on a single chip [1]- [4]. Attributed to the aggressive CMOS device scaling, the gate delay has been pushed below 14ps at 130nm logic technology node and will be approaching 10ps at 90nm node.…”
Section: Introductionmentioning
confidence: 99%
“…The focus comes from the need to deliver a reasonable amount of RF power for wireless communication. The RF noise and associated gain are critically important for front-end low noise amplifier (LNA), which sets the ultimate minimum noise floor for the whole communication system It turns out a difficult practice to get optimized RF power and noise performance than fT and gate delay due to strong and complicated interaction with the unavoided parasitic effects [2]- [4]. In this work, we have examined the mentioned important RF device characteristics OfG(nmax, fmax, NFmin, PIdB, and PAE and will demonstrate the excellent performance of 23/19dB GQax at 2.4/5.8Ghz, 80 GHz fmax, 2.2 dB noise at 10 GHz, lOdBm PIdB, and 55% PAE at 2.4 GHz under IV bias, all realized simultaneously by the 80nm n-MOSFETs at 0.13tm node.…”
Section: Introductionmentioning
confidence: 99%