Fundamentals of thin film depth profiling by glow discharge optical emission spectroscopy

Abstract

Glow discharge optical emission spectroscopy (GDOES) is a useful technique for qualitative plasma characterization. It also enables depth profiling of solid materials upon exposure of samples to energetic positively charged ions from gaseous plasma, providing specifics of both surface- and gas-phase collision phenomena that are considered. The early stages of developing GDOES useful for the determination of surface composition and depth profiling of solid materials are reviewed and analyzed, stressing the contribution of early authors. The advantages as well as drawbacks of the GDOES technique are presented and discussed. The recent applications of this technique for depth profiling of various materials are presented, and the directions for constructing a laboratory-scale device are provided.

Effect of the Substrate Materials in the Fabrication of an Electrode Based on Mixed Nickel‐Iron Oxide Electrocatalyst

“…The NiFeOx composition was analyzed by GDOES. [44] Electrochemical impedance spectroscopy (EIS) was conducted by ModuLabXM ECS (Solartron Analytical, Farnborough, U.K.) with an amplitude of 10 mV in the frequency range from 1 MHz to 100 mHz at open circuit potential.…”