The tunneling probability of electrons through a Si-p/n junction with additional dopants is calculated by the time evolution of wave packets using the simple one-dimensional tight-binding model. It was shown that the probability is markedly enhanced, being consistent with experiments. We showed that such enhancement is caused by the resonance between the isolated dopant electronic state and continuous conduction-or valenceband states of host Si in the junction. Moreover, we demonstrate that the probability strongly depends on the spatial and energy positions of the dopant electronic state. © 2019 The Japan Society of Applied Physics c c g = | | In particular, direct and indirect band-gap structures are produced using the negative and positive values for , c g respectively, together with the positive . v g Namely, the valence-band top and conduction-band bottom are located at the Γ point, i.e., the center of Brillouin zone with the Bloch wave number of k = 0, when v g > 0 and c g < 0, while they are, respectively, located at the Γ point and the boundary of Brillouin zone when v g > 0 and c g > 0. The second term describes the on-site energy b n , e of the b-band at the n site. To realize the p/n junction under the applied electric field, b n , e depends on the position of the site as