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2006
DOI: 10.2172/891600
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Fundamental Materials Research and Advanced Process Development for Thin-Film CIS-Based Photovoltaics: Final Technical Report, 2 October 2001 - 30 September 2005

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Cited by 4 publications
(3 citation statements)
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“…This indicated that the poor device performance could be due to the laser pulse also causing damage in the CIGSe/CdS interface region. Increasing the pulse number to 10 or 20 pulses 93 also showed similar improvements in Hall mobility. However, device measurements revealed that only the lowest laser fluence (30 mJ cm −2 ) led to an efficiency increase over the 9.1% efficient reference device.…”
Section: Pulsed Laser Annealingmentioning
confidence: 64%
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“…This indicated that the poor device performance could be due to the laser pulse also causing damage in the CIGSe/CdS interface region. Increasing the pulse number to 10 or 20 pulses 93 also showed similar improvements in Hall mobility. However, device measurements revealed that only the lowest laser fluence (30 mJ cm −2 ) led to an efficiency increase over the 9.1% efficient reference device.…”
Section: Pulsed Laser Annealingmentioning
confidence: 64%
“…The first published studies of sub-melt PLA of CISe were carried out by the group of Anderson, [93][94][95] which used co-evaporated CuðIn; GaÞSe 2 absorbers as pictured in Fig. 7b(i) with a CdS buffer layer deposited on the surface.…”
Section: Pulsed Laser Annealingmentioning
confidence: 99%
“…We consider that the reaction of these binary or elemental phases is thermodynamically favoured and leads to an improved recrystallization during annealing and therefore results in larger crystals. The approach of forming CuInSe 2 by annealing binary selenides has also followed by Anderson and coworkers (5)(6)(7)(8). They grow InSe/CuSe and In 2 Se 3 /CuSe stacks by migration enhanced epitaxy and perform insitu XRD measurements to study the reaction path.…”
Section: Introductionmentioning
confidence: 99%