2010
DOI: 10.1063/1.3496624
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Functionalizing self-assembled GaN quantum dot superlattices by Eu-implantation

Abstract: Self-assembled GaN quantum dots ͑QDs͒ stacked in superlattices ͑SL͒ with AlN spacer layers were implanted with Europium ions to fluences of 10 13 , 10 14 , and 10 15 cm −2 . The damage level introduced in the QDs by the implantation stays well below that of thick GaN epilayers. For the lowest fluence, the structural properties remain unchanged after implantation and annealing while for higher fluences the implantation damage causes an expansion of the SL in the ͓0001͔ direction which increases with implantatio… Show more

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Cited by 17 publications
(18 citation statements)
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“…After HTHP annealing at 1400 ºC a significant decrease of the SL peak intensity is observed which can be due to intermixing but also due to the deterioration of the crystal quality such as the occurrence of phase separation. The as-implanted sample continues to show intense SL peaks confirming little effect of the implantation on the interface properties, however, all SL peaks are seen to shift to lower angles in agreement with previous implantation studies in SL samples 42 and attributed to the expansion of the c-lattice parameter typically observed in ion implanted III-nitrides due to hydrostatic strain introduced by implantation defects 38,41,43 . Very high implantation fluences, on the other hand, can lead to ballistic intermixing and a strong decrease of SL peaks 44 .…”
Section: Methodssupporting
confidence: 88%
“…After HTHP annealing at 1400 ºC a significant decrease of the SL peak intensity is observed which can be due to intermixing but also due to the deterioration of the crystal quality such as the occurrence of phase separation. The as-implanted sample continues to show intense SL peaks confirming little effect of the implantation on the interface properties, however, all SL peaks are seen to shift to lower angles in agreement with previous implantation studies in SL samples 42 and attributed to the expansion of the c-lattice parameter typically observed in ion implanted III-nitrides due to hydrostatic strain introduced by implantation defects 38,41,43 . Very high implantation fluences, on the other hand, can lead to ballistic intermixing and a strong decrease of SL peaks 44 .…”
Section: Methodssupporting
confidence: 88%
“…22,23 GaN and AlN lms grown by hydride vapour phase epitaxy (HVPE) on c-plane sapphire were purchased from TDI Oxford instruments ($3 mm). All these samples were implanted simultaneously with two different uences: 1 Â 10 13 ions cm À2 and 1 Â 10 15 ions cm À2 , at the energy of 150 keV.…”
Section: Methodsmentioning
confidence: 99%
“…The as-grown sample #1110 was further submitted to thermal annealing treatments at 1200°C in flowing N 2 at 1 mbar pressure and placing a piece of AlN/sapphire face-to-face with the samples as a proximity cap to protect the surface during the high temperature treatment. The #987 and #989 GaN QD/AlN SL were implanted with high (1 × 10 14-15 ions cm -2 ) and low (1 × 10 13 ions cm -2 ) fluences of Europium ions; the SL structures were further submitted to post-implantation thermal annealing in order to achieve Eu 3+ optical activation [ 17 , 18 ].…”
Section: Methodsmentioning
confidence: 99%