2018
DOI: 10.1088/1361-648x/aaddd3
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Functionalization and passivation of ultrathin alumina films of defined sub-nanometer thickness with self-assembled monolayers

Abstract: Instability of ultrathin surface oxides on alloys under environmental conditions can limit the opportunities for applications of these systems when the thickness control of the insulating oxide film is crucial for device performance. A procedure is developed to directly deposit self-assembled monolayers (SAM) from solvent onto substrates prepared under ultra-high vacuum conditions without exposure to air. As an example, rhenium photosensitizers functionalized with carboxyl linker groups are attached to ultrath… Show more

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Cited by 6 publications
(17 citation statements)
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“…The 2L-alumina/NiAl(110) samples were rinsed three times with 0.1 mM solution of the rhenium molecules dissolved in acetonitrile (CH 3 CN) to form multilayers. After that, the samples were rinsed three times with pure CH 3 CN to remove physisorbed molecules, and a monolayer of chemisorbed molecules was left on the surface, as described previously by our group . After pump down of the chamber, the samples could be transferred under vacuum back into the UHV system for surface characterization.…”
Section: Methodsmentioning
confidence: 99%
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“…The 2L-alumina/NiAl(110) samples were rinsed three times with 0.1 mM solution of the rhenium molecules dissolved in acetonitrile (CH 3 CN) to form multilayers. After that, the samples were rinsed three times with pure CH 3 CN to remove physisorbed molecules, and a monolayer of chemisorbed molecules was left on the surface, as described previously by our group . After pump down of the chamber, the samples could be transferred under vacuum back into the UHV system for surface characterization.…”
Section: Methodsmentioning
confidence: 99%
“…47 Upon SAM deposition, a slight increase of the Al 3+ component between 74 and 75 eV is observed, due to remaining impurities in the solvent and the tendency of 2L-alumina/NiAl(110) to further oxidation, as described in earlier work. 26 This rise is identical for all three molecules, and we quantify the total oxide thickness after molecule deposition to be 2.5 atomic layers.…”
Section: ■ Introductionmentioning
confidence: 96%
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