2014
DOI: 10.1007/978-3-319-02081-5
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Functional Nanostructures Fabricated by Focused Electron/Ion Beam Induced Deposition

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Cited by 14 publications
(8 citation statements)
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“…These small differences in composition are not expected to produce nanoscale inhomogeneous superconducting properties. In fact, previous experiments in flat W–C deposits performed by varying the growth beam voltage (from 5 to 30 kV) and the growth beam incidence angle (from 28 to 90°) gave rise to greater changes in the Ga and W content without affecting the measured T c [49]. …”
Section: Resultsmentioning
confidence: 99%
“…These small differences in composition are not expected to produce nanoscale inhomogeneous superconducting properties. In fact, previous experiments in flat W–C deposits performed by varying the growth beam voltage (from 5 to 30 kV) and the growth beam incidence angle (from 28 to 90°) gave rise to greater changes in the Ga and W content without affecting the measured T c [49]. …”
Section: Resultsmentioning
confidence: 99%
“…In contrast to electron/ion-impact-induced breaking, FEB and FIB can also narrow the gap down to a few nanometers via local deposition, [147] as shown in Figure 7A. Focused-electron-beaminduced deposition (FEBID) and its sister technique focusedion-beam-induced deposition (FIBID) are both single-step direct-write nanolithography techniques based on the dissociation of the gaseous precursor molecules by a nanometer-size electron and ion beam, [148] respectively.…”
Section: Electron/ion-beam-induced Depositionmentioning
confidence: 99%
“…Similarly to EB, FIB has significant disadvantages, including very low throughput (typically 10 to 13 m 2 /s with a high resolution of 30% milling coefficient). [63,64] However, soft lithography can overcome these limitations and various disadvantages of EBL and FIB. [65] Also, it can create arrays with a large area of the nano-antennas with high accuracy.…”
Section: Fabrication Possibilitiesmentioning
confidence: 99%