2014
DOI: 10.1021/am504786b
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Fully Porous GaN p–n Junction Diodes Fabricated by Chemical Vapor Deposition

Abstract: Introduction

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Cited by 28 publications
(37 citation statements)
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“…This turn-on voltage is even lower in the fully porous p-n junctions, lying in the range (E g /4q) -(E g /6q), resembling more the response observed in InN, GaN and other p-n junctions nanowires arrays (51,52). Microscopic characterization confirmed well-defined interfaces between the porous and the non-porous GaN (50), indicating that no significant tunneling barriers exist either at the GaN-GaN interface or on the surface of the GaN/Ohmic contacts. Thus, the barrier potentials are a function of the donor and acceptor densities.…”
Section: Epitaxial Growth Of Nanoporous Gan Filmssupporting
confidence: 56%
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“…This turn-on voltage is even lower in the fully porous p-n junctions, lying in the range (E g /4q) -(E g /6q), resembling more the response observed in InN, GaN and other p-n junctions nanowires arrays (51,52). Microscopic characterization confirmed well-defined interfaces between the porous and the non-porous GaN (50), indicating that no significant tunneling barriers exist either at the GaN-GaN interface or on the surface of the GaN/Ohmic contacts. Thus, the barrier potentials are a function of the donor and acceptor densities.…”
Section: Epitaxial Growth Of Nanoporous Gan Filmssupporting
confidence: 56%
“…Thus, n-type (48) or p-type (43) porous GaN epitaxial layers were deposited on non-porous GaN substrates with complementary electrical conductivity to produce partially porous GaN diodes. To produce fully porous GaN diodes by CVD, a two step synthesis process was used in which first a n-type or p-type porous GaN epitaxial layer was produced, and then in the second step a new porous GaN epitaxial layer with complementary electrical conductivity was overgrown on the previous porous layer (50), as can be seen in the scheme shown in Figure 7 (a).…”
Section: Epitaxial Growth Of Nanoporous Gan Filmsmentioning
confidence: 99%
“…Recent SEM characterizations of GaN nanorods have extended conventional mapping by adding in-situ electrical biasing thus enabling the direct imaging of the p-n junction under operational conditions and yielding critical information on its depletion width89. Other techniques like cathode-luminescence in a scanning transmission microscope (CL-STEM)10 and conductive atomic force microscopy (AFM) have also been utilized for the characterization of the p-n junction in GaN nanorods11 and porous GaN based LEDs12. The properties of p-n junctions in photodiodes and photovoltaics have also been extensively investigated using a combination of electrical and optical analyses tools13141516171819.…”
mentioning
confidence: 99%
“…Regarding wide band gap semiconductors, very impressive results were recently published concerning white light emission using porous silicon carbide, a chemically inert semiconductor 7 . Applications of porous gallium nitride and related heterostructures already appear in various areas, among which are the high sensitivity hydrogen gas sensors 8 , water splitting 9 , energy storage 10,11 , development of a new substrate transfer technology 12 , fabrication of light-emitting devices 13,14 and microcavities 15 .…”
Section: Introductionmentioning
confidence: 99%