2011
DOI: 10.1002/ppap.201100067
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Full‐Thickness Characterization of Plasma Polymerized Hexane Films Irradiated by an Electron Beam

Abstract: Thin plasma polymerized hexane (ppHex) films have been shown to be useful as a novel resist for electron beam lithography. We present time‐of‐flight secondary ion mass spectroscopy analysis of ∼50 nm thick ppHex films deposited at two different RF powers (10 and 50 W) followed by exposure to an electron beam at various doses. As‐deposited, high‐power and low‐power films exhibit differences in chemical composition, explaining an experimentally observed difference in solubility. Exposure of the ppHex films to an… Show more

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Cited by 9 publications
(4 citation statements)
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“…A hypothesis is that radicals still present in the vertical gradient structure, mostly migrating up from the cross-linked subsurface layer close to the vertical gradient structure, react with ambient air, thereby modifying the surface by oxidation and hydrolysis, as was also mentioned in the literature . Generally, the PPF deposited with a lower CO 2 /C 2 H 4 ratio contains more radicals, but its polymer segments are less mobile due to a higher cross-linking density, , except for the near-surface layer, which retains higher mobility due to less cross-linking. , For the reference highly cross-linked layer, where we would expect a higher WCA, the higher amounts of radicals react with ambient air resulting in a lower initial WCA, coinciding with the WCA for the vertical gradient structures and the reference oxygen-rich layer (Figure b). The long-term increase of WCA for the reference coatings then is probably due to hydrophobic recovery, where the reference oxygen-rich layer reaches the final WCA values more slowly due to the subsurface reservoir of polar groups and ongoing reorientation and migration.…”
Section: Resultsmentioning
confidence: 86%
“…A hypothesis is that radicals still present in the vertical gradient structure, mostly migrating up from the cross-linked subsurface layer close to the vertical gradient structure, react with ambient air, thereby modifying the surface by oxidation and hydrolysis, as was also mentioned in the literature . Generally, the PPF deposited with a lower CO 2 /C 2 H 4 ratio contains more radicals, but its polymer segments are less mobile due to a higher cross-linking density, , except for the near-surface layer, which retains higher mobility due to less cross-linking. , For the reference highly cross-linked layer, where we would expect a higher WCA, the higher amounts of radicals react with ambient air resulting in a lower initial WCA, coinciding with the WCA for the vertical gradient structures and the reference oxygen-rich layer (Figure b). The long-term increase of WCA for the reference coatings then is probably due to hydrophobic recovery, where the reference oxygen-rich layer reaches the final WCA values more slowly due to the subsurface reservoir of polar groups and ongoing reorientation and migration.…”
Section: Resultsmentioning
confidence: 86%
“…Simply layering multiple ppHex films before etching resulted in a poor quality etch. It is assumed that the film composition, in terms of oxygen/carbon, ratio is modified by exposure to atmospheric conditions,30, 31 which may result in variations in spatial selectivity and thus an inhomogeneous etch. Atomic force microscopy (AFM) analysis of the replica surface in the etched region (in groove) and the masked region (on ridge) showed an root‐mean‐square (RMS) roughness of 4.5 and 1.3 nm, respectively.…”
Section: Resultsmentioning
confidence: 99%
“…This organic-inorganic multilayer TFE structure has the advantage of improving exibility as well as moisture barrier properties. Organic materials used for this purpose include polymers formed through solution processes [9][10][11][12][13][14][15] and polymers deposited using vacuum processes such as initiated CVD [16-20], thermal CVD [21], or plasma polymerization [22][23][24][25][26][27][28][29][30][31][32][33][34]. In addition, organic layers deposited by molecular layer deposition (MLD) method using a surface self-limited reaction similar to ALD can also be included in this category [35][36][37][38][39][40][41][42][43][44].…”
Section: Introductionmentioning
confidence: 99%