2017
DOI: 10.1016/j.apsusc.2016.11.122
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Full densification of inkjet-printed copper conductive tracks on a flexible substrate utilizing a hydrogen plasma sintering

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Cited by 38 publications
(27 citation statements)
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“…[33] Fast plasma treatment of surfaces has become an extremely populara pproach. [36] Low-pressure hydrogen plasma has also been used to modify ZnO, [37] indiumdoped tin oxide, [38] TiO 2 , [39][40][41][42] aluminum-dopedz inc-tin oxide, [43] and GO. However,m ost of the investigations in This study concerns al ow-temperature method for dry hydrogen plasma reduction of inkjet-printed flexible graphene oxide (GO) electrodes, an approachc ompatible with processes envisaged for the manufacture of flexible electronics.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…[33] Fast plasma treatment of surfaces has become an extremely populara pproach. [36] Low-pressure hydrogen plasma has also been used to modify ZnO, [37] indiumdoped tin oxide, [38] TiO 2 , [39][40][41][42] aluminum-dopedz inc-tin oxide, [43] and GO. However,m ost of the investigations in This study concerns al ow-temperature method for dry hydrogen plasma reduction of inkjet-printed flexible graphene oxide (GO) electrodes, an approachc ompatible with processes envisaged for the manufacture of flexible electronics.…”
Section: Introductionmentioning
confidence: 99%
“…Kwon et al used low-pressure hydrogen plasma for full densification of inkjet-printed copperc onductive tracks on flexible PET substrates. [36] Low-pressure hydrogen plasma has also been used to modify ZnO, [37] indiumdoped tin oxide, [38] TiO 2 , [39][40][41][42] aluminum-dopedz inc-tin oxide, [43] and GO. [7,44,45] The effects of hydrogen plasma on graphene surface chemistry have been addressed comprehensively by Felten et al [46] However,l ow-pressure plasma is not compatible with the fast, inline, roll-to-roll processes demanded by the economical manufacture of flexible electronics.…”
Section: Introductionmentioning
confidence: 99%
“…[ 25 ] Another study significantly improved the conductivity of printed and plasma‐sintered Cu MOD ink to 55% of the bulk conductivity by using a low‐pressure RF‐powered H 2 plasma. [ 22 ]…”
Section: Schemesmentioning
confidence: 99%
“…Recently, Kwon et al 52 demonstrated a novel hydrogen plasma sintering method (150°C for 10-20 min) that achieved a full reduction and densification of inkjet-printed patterns using a Cu complex ion ink. The plasma-treated pattern showed a fully densified microstructure with a resistivity of 3.2 lX cm ( Fig.…”
Section: Ink Based On Conductive Nanomaterialsmentioning
confidence: 99%