2002
DOI: 10.1039/b206336k
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FTIR study of low-temperature CO adsorption on high surface area tin(iv) oxide: Probing Lewis and Brønsted acidity

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Cited by 29 publications
(19 citation statements)
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References 35 publications
(75 reference statements)
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“…These results are in agreement with FTIR studies of SnO 2 samples at 120 K at low CO pressures which showed an adsorption band at 2210-2196 cm −1 associated to CO bound to a coordinational unsaturated Sn 4+ surface species [40]. These results are in agreement with FTIR studies of SnO 2 samples at 120 K at low CO pressures which showed an adsorption band at 2210-2196 cm −1 associated to CO bound to a coordinational unsaturated Sn 4+ surface species [40].…”
Section: Co Adsorption On Clean Sno 2 (1 1 0) Surfacessupporting
confidence: 91%
“…These results are in agreement with FTIR studies of SnO 2 samples at 120 K at low CO pressures which showed an adsorption band at 2210-2196 cm −1 associated to CO bound to a coordinational unsaturated Sn 4+ surface species [40]. These results are in agreement with FTIR studies of SnO 2 samples at 120 K at low CO pressures which showed an adsorption band at 2210-2196 cm −1 associated to CO bound to a coordinational unsaturated Sn 4+ surface species [40].…”
Section: Co Adsorption On Clean Sno 2 (1 1 0) Surfacessupporting
confidence: 91%
“…Both materials show obvious differences in the nature and intensities of the hydroxyl groups: The UD450 material displays a series of vibrations assigned to isolated terminal (3723, 3662 and 3628 cm -1 ) and rooted (3527 and 3485 cm -1 ) hydroxyl groups 20,30,31 . Moreover, the hydroxyl region is dominated by a broad band between 3680 and 2610 cm -1 indicating a high concentration of bridged hydroxyl groups.…”
Section: Resultsmentioning
confidence: 99%
“…On the other hand, the number of free OH groups and Al 3+ sites did not change any more at 1.6 or 2.4 wt.% Sn. Some increase in Lewis acid sites could be explained by the formation of Sn 4+ sites [52]. The decrease of H-bonded OH groups is more pronounced for the highest Sn amount.…”
Section: Tin Deposition On Como/al 2 O 3 Sulfide Via Somcmentioning
confidence: 99%