Fringe field theory and experiment for electrostatic chucking of extreme ultraviolet photomasks

Abstract

Articles you may be interested inPlasma etch method for extreme ultraviolet lithography photomask Appl. Phys. Lett. 90, 063105 (2007); 10.1063/1.2470470 Electrostatic chuck fringe field simulation and its impact on electron beam extreme ultraviolet mask patterning Effect of electrostatic chucking and substrate thickness uniformity on extreme ultraviolet lithography mask flatness J.