The initial project objectives were twofold; namely, to determine the optical and gettering properties of titanium and titanium oxy-nitride films, and to examine the influence of carrier recombination processes on the microwave reflection coefficient in the frequency domain such that PV materials parameters could be evaluated non-destructively. A third topic was added as the main focus of our six month contract extension, wherein we carried out a detailed characterization study of dislocated, high purity, float zone crystals grown at NREL by Ted Cizsek. These were compared with nitrogen doped CZ wafers. The accompanying report has a chapter devoted to each of these topics presented in reverse order of the above list. Highlights of these chapters include the following . With regard to dislocated FZ material we note that the average carrier lifetimes of 50 to 100 microseconds in heavily dislocated areas are still quite high for PV applications. This is attributed to the fact that the dislocations are "clean" in this high purity FZ crystal and relatively inactive electrically. This relatively low impact of a high density of dislocations on minority carrier recombination lifetime leads us to believe that the proper tailoring of SiO 2 precipitation phenomena will enable long diffusion length PV wafers to be produced which also exhibit enhanced mechanical yield behavior. Thus, the above ongoing electrical/structural approach is being extended to low oxygen content CZ wafers, as well as FZ wafers with deliberately added concentrations of oxygen. In addition, a processing bonus related to a near surface defect band induced surface texture in nitrogen doped CZ wafers is likely to have a positive impact on single crystal PV devices by simultaneously providing surface texturing and a near surface gettering sink for bulk impurities.The microwave photoconductance method was a relation for the microwave reflection coefficient in the frequency domain was found. A single level Shockley-Read-Hall nonstationary recombination model was used for the description of the carrier kinetics. Although six parameters, i.e., surface recombination velocity v s , diffusivity D n , activation energy E r , electron/hole capture cross sections σ n , σ p , and concentration N r were analyzed, only four are robust; namely v s , E r , N r c n and σ p /σ n , and among them two, E r and σ p /σ n , can be used as material parameters. These two parameters were evaluated from the frequency resolved spectra for silicon wafers intentionally contaminated with Ni and Fe. The E r and σ p /σ n values obtained for Fe, and Fe+Ni contaminated wafers were equivalent, while in the presence of Ni, the above parameters were different, indicating that these parameters can be used for material characterizationThe titanium thin film study revealed that a TiN x O y film exhibits the best optical quality; however, poor interface formation between the film and surface due to strong Ti and O bonds eliminates that film as a good external getter. Both Ti and TiN x films have ...