2004
DOI: 10.1016/j.spmi.2004.09.013
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Free-to-bound radiative recombination in highly conducting InN epitaxial layers

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Cited by 11 publications
(5 citation statements)
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“…Those polycrystalline or nanocrystalline films often had high electron densities and low mobilities, although low-density high-mobility samples were also reported. Those results were confirmed by absorption and luminescence measurements on many samples grown by different groups [159,[191][192][193][194][195][196][197][198][199][200][201][202][203][204][205][206][207]. In 2001, however, optical characterizations of MBEgrown single-crystal InN indicated E g ≈ 0.7 eV [185][186][187][188][189][190], which represented a dramatic re-evaluation.…”
Section: Innmentioning
confidence: 83%
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“…Those polycrystalline or nanocrystalline films often had high electron densities and low mobilities, although low-density high-mobility samples were also reported. Those results were confirmed by absorption and luminescence measurements on many samples grown by different groups [159,[191][192][193][194][195][196][197][198][199][200][201][202][203][204][205][206][207]. In 2001, however, optical characterizations of MBEgrown single-crystal InN indicated E g ≈ 0.7 eV [185][186][187][188][189][190], which represented a dramatic re-evaluation.…”
Section: Innmentioning
confidence: 83%
“…Earlier measurements of the InN electron mass yielded 0.11m 0 [181], 0.12m 0 [232], and 0.14m 0 [233], as well as 0.24m 0 perpendicular to the c axis [234]. Masses in the 0.04-0.11m 0 range have been reported in the more recent literature, based on both experiments and calculations [81,194,200,203,207,210,211,[235][236][237][238][239]. Since only values in the lower half of this range are consistent with our adoption of small E g , based on the recent experiments [238] and supported by theory [237] we recommend a band-edge mass of 0.07m 0 (relatively isotropic).…”
Section: Innmentioning
confidence: 84%
“…InN has been extensively studied since the discovery of its true band gap energy of about 0.65 eV. [1][2][3][4][5] The advantages of InN such as the smallest direct-band gap energy and the largest mobility among III-nitride semiconductors [6][7][8][9] make it a very promising material in various applications including high-speed electronic and long-wavelength optoelectronic devices. To date, almost all InN thin films were grown on foreign substrates.…”
Section: Introductionmentioning
confidence: 99%
“…A numerical analysis of the effect of ntype doping on the shape and energy position of the PL in InN can be found in Ref. [13].…”
mentioning
confidence: 99%