2007
DOI: 10.1049/mnl:20070044
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Free-standing polymer cantilevers and bridges reinforced with carbon nanotubes

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“…Patterning through selective removal of portions of the multilayer film can be performed through conventional photolithographic methods using photoresists and/or metal masks (Figure ), , although reversible patterning with masks can be performed without material loss if photoswitchable materials are incorporated . LbL films can be assembled on top of already patterned photoresists, after which portions can be removed through lift-off (dissolution of the photoresist) .…”
Section: Unconventional Lbl Assemblymentioning
confidence: 99%
“…Patterning through selective removal of portions of the multilayer film can be performed through conventional photolithographic methods using photoresists and/or metal masks (Figure ), , although reversible patterning with masks can be performed without material loss if photoswitchable materials are incorporated . LbL films can be assembled on top of already patterned photoresists, after which portions can be removed through lift-off (dissolution of the photoresist) .…”
Section: Unconventional Lbl Assemblymentioning
confidence: 99%