Free-Standing Magnetic Nanopillars for 3D Nanomagnet Logic

Gavagnin, Marco; Wanzenboeck, Heinz D.; Wachter, Stefan; Shawrav, Mostafa M.; Persson, Anders; Gunnarsson, Klas; Svedlindh, Peter; Stöger-Pollach, Michael; Bertagnolli, E.

doi:10.1021/am505785t

Cited by 54 publications

(59 citation statements)

References 37 publications

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“…Typically, a Scanning Electron Microscope (SEM) is used for FEBID, and various scanning strategies allow for the growth of magnetic dots [10], nanowires [11], pillars and nano-helices [12,13], nanospheres [14], spin-ice structures [15], etc. FEBID is well suited to be used on unconventional substrates, such as cantilevers, leading to its application in magnetic force microscopy [16][17][18] and…”

Section: Introductionmentioning

confidence: 99%

High Volume-Per-Dose and Low Resistivity of Cobalt Nanowires Grown by Ga+ Focused Ion Beam Induced Deposition

Sanz-Martín

Magén

2019

Nanomaterials

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The growth of ferromagnetic nanostructures by means of focused-Ga + -beam-induced deposition (Ga + -FIBID) using the Co 2 (CO) 8 precursor has been systematically investigated. The work aimed to obtain growth conditions allowing for the simultaneous occurrence of high growth speed, good lateral resolution, low electrical resistivity, and ferromagnetic behavior. As a first result, it has been found that the competition between deposition and milling that is produced by the Ga + beam is a limiting factor. In our working conditions, with the maximum available precursor flux, the maximum deposit thickness has been found to be 65 nm. The obtained volumetric growth rate is at least 50 times higher than in the case of deposition by focused-electron-beam-induced deposition. The lateral resolution of the deposits can be as good as 50 nm while using Ga + -beam currents lower than 10 pA. The high metallic content of the as-grown deposits gives rise to a low electrical resistivity, within the range 20-40 µΩ·cm. Magnetic measurements confirm the ferromagnetic nature of the deposits at room temperature. In conclusion, the set of obtained results indicates that the growth of functional ferromagnetic nanostructures by Ga + -FIBID while using the Co 2 (CO) 8 precursor is a viable and competitive technique when compared to related nanofabrication techniques. Nanomaterials 2019, 9, 1715 2 of 12 magnetic resonance force microscopy, in sharp contrast to other nanofabrication techniques requiring resists [19]. Other reported applications of magnetic FEBID deposits comprise nanoactuation [20], domain-wall pinning [21], nano-Hall sensors [22], nanomagnetic logic [23], superconducting-vortex pinning [24,25], etc. In addition, the capability of FEBID for the growth of complex three-dimensional (3D) magnetic structures is being explored in the rising field of 3D nanomagnetism [26].FEBID has long suffered from two disadvantages when compared to other nanofabrication techniques: the material purity and the growth speed. In the last years, various growth strategies and post-growth purification treatments have been successfully developed to enhance the material purity of magnetic deposits that are grown by FEBID [27][28][29][30][31][32]. However, the growth speed of magnetic nanostructures by FEBID continues to be a bottleneck regarding its broader use. Existing literature on the topic indicates that the volumetric growth rate of nanostructures with the widely-used Co 2 (CO) 8 precursor is in the range of 0.002 µm 3 /nC [33]. Low electron currents must be used to obtain magnetic structures with good lateral resolution (below 1 nA), which gives rise to long growth times. As an example, the growth of a 100 nm-thick 1 µm 2 -rectangle takes 8 min. if an electron beam current of 100 pA is used.In the present work, we have systematically explored the possibility of using a Ga + focused ion beam to grow Co magnetic nanostructures with good lateral resolution, low electrical resistance, and high growth speed by means of the Focused Ion Beam Induced De...

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Section: Introductionmentioning

confidence: 99%

High Volume-Per-Dose and Low Resistivity of Cobalt Nanowires Grown by Ga+ Focused Ion Beam Induced Deposition

Sanz-Martín

Magén

2019

Nanomaterials

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“…In Figure 1, various applications of FEBID and FIBID are sketched: the growth of in-plane and three-dimensional nanostructures on flat substrates [25], as well as on unconventional substrates such as cantilevers/tips [26], and flexible [27], insulating [28] or origami substrates [28], etc. Materials grown by FEBID/FIBID are currently used for circuit edit and mask repair in the semiconductor industry [24,[29][30][31], lamellae preparation [7], the placement of electrical contacts to micro-and nano-structures [32,33], for producing sensors [34,35] and magnetic tips [36][37][38], plasmonic [39][40][41][42] and nano-optical elements [43], superconducting films [44] and nanowires [45], etc. Although FEBID/FIBID is an active field of research and development, a wider impact is hampered by the limited process speed.…”

Section: Focused Electron/ion Beam-induced Deposition Techniquesmentioning

confidence: 99%

Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions

2019

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In this contribution, we compare the performance of Focused Electron Beam-induced Deposition (FEBID) and Focused Ion Beam-induced Deposition (FIBID) at room temperature and under cryogenic conditions (the prefix "Cryo" is used here for cryogenic). Under cryogenic conditions, the precursor material condensates on the substrate, forming a layer that is several nm thick. Its subsequent exposure to a focused electron or ion beam and posterior heating to 50 • C reveals the deposit. Due to the extremely low charge dose required, Cryo-FEBID and Cryo-FIBID are found to excel in terms of growth rate, which is typically a few hundred/thousand times higher than room-temperature deposition. Cryo-FIBID using the W(CO) 6 precursor has demonstrated the growth of metallic deposits, with resistivity not far from the corresponding deposits grown at room temperature. This paves the way for its application in circuit edit and the fast and direct growth of micro/nano-electrical contacts with decreased ion damage. The last part of the contribution is dedicated to the comparison of these techniques with other charge-based lithography techniques in terms of the charge dose required and process complexity. The comparison indicates that Cryo-FIBID is very competitive and shows great potential for future lithography developments.

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Section: Metal Am Techniques For the Microscalementioning

confidence: 99%

“…In summary, we will compare AM techniques that enable the synthesis of metallic or metal‐containing structures in a one‐step process with a minimum feature size better than 10 µm and an aspect ratio of at least two. Based on our literature search, we will include the following methods: Direct ink writing (DIW)Electrohydrodynamic printing ((EHD) printing) Local electrophoretic deposition Laser‐induced forward transfer (LIFT) Meniscus‐confined electroplating Electroplating of locally dispensed ions in liquid Laser‐induced photoreduction Focused electron/ion beam induced deposition (FEBID/FIBID)…”

Section: Introductionmentioning

confidence: 99%

Additive Manufacturing of Metal Structures at the Micrometer Scale

et al. 2017

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Currently, the focus of additive manufacturing (AM) is shifting from simple prototyping to actual production. One driving factor of this process is the ability of AM to build geometries that are not accessible by subtractive fabrication techniques. While these techniques often call for a geometry that is easiest to manufacture, AM enables the geometry required for best performance to be built by freeing the design process from restrictions imposed by traditional machining. At the micrometer scale, the design limitations of standard fabrication techniques are even more severe. Microscale AM thus holds great potential, as confirmed by the rapid success of commercial micro-stereolithography tools as an enabling technology for a broad range of scientific applications. For metals, however, there is still no established AM solution at small scales. To tackle the limited resolution of standard metal AM methods (a few tens of micrometers at best), various new techniques aimed at the micrometer scale and below are presently under development. Here, we review these recent efforts. Specifically, we feature the techniques of direct ink writing, electrohydrodynamic printing, laser-assisted electrophoretic deposition, laser-induced forward transfer, local electroplating methods, laser-induced photoreduction and focused electron or ion beam induced deposition. Although these methods have proven to facilitate the AM of metals with feature sizes in the range of 0.1-10 µm, they are still in a prototype stage and their potential is not fully explored yet. For instance, comprehensive studies of material availability and material properties are often lacking, yet compulsory for actual applications. We address these items while critically discussing and comparing the potential of current microscale metal AM techniques.

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Free-Standing Magnetic Nanopillars for 3D Nanomagnet Logic

Cited by 54 publications

References 37 publications

High Volume-Per-Dose and Low Resistivity of Cobalt Nanowires Grown by Ga+ Focused Ion Beam Induced Deposition

High Volume-Per-Dose and Low Resistivity of Cobalt Nanowires Grown by Ga+ Focused Ion Beam Induced Deposition

Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions

Additive Manufacturing of Metal Structures at the Micrometer Scale

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