Free-radical chain formation of siloxanes in the radiolysis of monosilane-nitric oxide mixtures

Positive Ion Chemistry of SiH4/NF3 Gaseous Mixtures Studied by Ion Trap Mass Spectrometry

“…[7][8][9] the rate constants, the thermochemistry, and the mechanistic aspects of the ionic processes occurring in ionised SiH 4 have been discussed, in particular, in two series of benchmark experimental [10][11][12][13][14][15] and theoretical [16][17][18][19] studies. the ion chemistry occurring in SiH 4 -based mixtures has been also investigated with considerable interest (especially by Lambert and co-workers), [20][21][22][23][24][25][26][27][28][29][30][31][32][33][34][35][36][37] related also to the role of ionic species in the formation of electronic and optoelectronic materials by chemical vapour deposition techniques. 38 In particular, to investigate the conceivable contribution of Si-c ion clusters and Si-c ionic species "doped" with N or P atoms in the formation of photovoltaic silicon carbides, [39][40][41] some of us have extensively studied the ionic reactions occurring in binary [42][43][44][45][46][47][48][49] and ternary mixt...…”

Positive Ion Chemistry of SiH4/GeF4 Gaseous Mixtures Studied by Ion Trap Mass Spectrometry and Ab Initio Calculations

“…these systems are, in fact, employed to deposit electronic and opto-electronic materials by chemical vapour deposition techniques, 1 and it is of interest to investigate the conceivable role of ionic species in the early stages of the polymerisation. thus, over the last four decades, numerous experimental and theoretical studies have been reported concerning the ion-molecule reactions occurring in ionised SiH 4 , [2][3][4][5][6][7][8][9][10][11][12] and in mixtures of SiH 4 with hydrogen, 13 hydrocarbons, [14][15][16][17][18][19][20][21][22] inorganic oxides, 23,24 water 25 and ammonia. 26,27 In particular, to investigate the contribution of Si-c ion clusters and Si-c ionic species "doped" with N or P atoms in the formation of photovoltaic silicon carbides, [28][29][30] some of us extensively studied the ionic reactions occurring in binary [31][32][33][34][35][36][37][38] and ternary mixtures [39][40][41][42][43][44] cont...…”

Gas‐phase reactions of SiHn+ (n = 1,2) with NF3: A computational investigation on the detailed mechanistic aspects

“…[1] Thus, over the years, the gasphase ion chemistry of binary and ternary mixtures containing SiH 4 and hydrogen, [2] hydrocarbons, [3][4][5][6][7][8][9][10][11][12][13][14][15][16] water, [17] inorganic oxides, [18,19] ammonia, [20][21][22][23][24] phosphine, [25][26][27][28][29] and halocarbons [30][31][32] was investigated by various experimental and theoretical methods. [1] Thus, over the years, the gasphase ion chemistry of binary and ternary mixtures containing SiH 4 and hydrogen, [2] hydrocarbons, [3][4][5][6][7][8][9][10][11][12][13][14][15][16] water, [17] inorganic o...…”

“…The gas-phase reactions of the cationic silicon hydrides SiH n þ (n ¼ 0-3) are of interest for fundamental reasons, and also to appreciate the role of ionic processes in the chemical vapor deposition of electronic and optoelectronic materials from gaseous mixtures containing SiH 4 . [1] Thus, over the years, the gasphase ion chemistry of binary and ternary mixtures containing SiH 4 and hydrogen, [2] hydrocarbons, [3][4][5][6][7][8][9][10][11][12][13][14][15][16] water, [17] inorganic oxides, [18,19] ammonia, [20][21][22][23][24] phosphine, [25][26][27][28][29] and halocarbons [30][31][32] was investigated by various experimental and theoretical methods. More recently, ion trap mass spectrometry (ITMS) and ab initio calculations were used to study the reactions occurring in ionized mixtures of SiH 4 and NF 3 .…”