2018
DOI: 10.1016/j.matdes.2018.01.015
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Fracture of Silicon: Influence of rate, positioning accuracy, FIB machining, and elevated temperatures on toughness measured by pillar indentation splitting

Abstract: The pillar indentation splitting test is a novel technique for assessing the fracture behavior of materials using micro-scale pillar samples. One typical limitation of this technique is the necessity of fabricating samples using focused ion beam (FIB) machining, which both creates damage to the samples and limits the number of samples which can be manufactured in a set timeframe. An alternative fabrication technique, lithography, is used here to fabricate a large number of (100)oriented, Silicon micro-pillar s… Show more

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Cited by 63 publications
(41 citation statements)
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“…However, micropillar compression is not straightforward. Even at room temperature, there can be issues of reproducibility arising from the variation in precise pillar dimensions, including, for example, edge rounding and side wall taper [27], and possible damage from the ion beam [28][29][30][31] used to produce the pillar. Care must be taken to minimise the possible effect of ion beam damage on nucleation and slip of dislocations from the sample surface.…”
Section: Introductionmentioning
confidence: 99%
“…However, micropillar compression is not straightforward. Even at room temperature, there can be issues of reproducibility arising from the variation in precise pillar dimensions, including, for example, edge rounding and side wall taper [27], and possible damage from the ion beam [28][29][30][31] used to produce the pillar. Care must be taken to minimise the possible effect of ion beam damage on nucleation and slip of dislocations from the sample surface.…”
Section: Introductionmentioning
confidence: 99%
“…Micropillars were fabricated by focused ion beam (FIB) cutting using an Auriga cross-beam instrument (Carl Zeiss Microscopy, Oberkochen, Germany) operated at an acceleration voltage and beam currents of 30 kV and 2-16 nA, respectively. In order to minimize any potential influence of FIB damage on K IC , the diameter of the pillars should be 10 lm or larger [38]. Therefore, for each specimen 5 pillars with a target diameter of 10 lm were cut.…”
Section: Methodsmentioning
confidence: 99%
“…For each pillar, topographic images were recorded in order to confirm the pillar geometry using a laser confocal LEXT OLS6000 microscopy instrument (OLYMPUS, Hamburg, Germany) employing a step size of 0.2 lm. The positioning of the indenter tip in the center of the pillars was ensured and errors due to indenter positioning can be neglected [38]. Subsequently load-controlled indentation tests were performed at a load rate of 0.5 mN/s to split the pillars using a NanoXtrem nanoindenter (Micro Materials, Wrexham, UK) equipped with a Berkovich type diamond tip.…”
Section: Methodsmentioning
confidence: 99%
“…cutting using an Auriga cross-beam instrument (Carl Zeiss Microscopy, Oberkochen, Germany) operated at an acceleration voltage and beam currents of 30 kV and 2-16 nA, respectively. In order to minimize any potential in uence of FIB damage on K IC , the diameter of the pillars should be 10 µm or larger [33].…”
Section: Methodsmentioning
confidence: 99%
“…For each pillar, topographic images were recorded in order to con rm the pillar geometry using a laser confocal LEXT OLS6000 microscopy instrument (OLYMPUS, Hamburg, Germany) employing a step size of 0.2 µm. The positioning of the indenter tip in the center of the pillars was ensured and errors due to indenter positioning can be neglected [33]. Subsequently load-controlled indentation tests were performed at a load rate of 0.5 mN/s to split the pillars using a NanoXtrem nanoindenter (Micro Materials, Wrexham, UK) equipped with a Berkovich type diamond tip.…”
Section: Methodsmentioning
confidence: 99%