DOI: 10.3990/1.9789036554251
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Fracture behavior and characterization of free-standing metal silicide thin films

Abstract: In situ transmission electron microscopy tensile testing of Zr x Si 1-x films 71 4.

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“…In contrast to the temperature trends observed for the pellicle structure, the overall thermal stress of the metal-silicide core pellicle is higher than that of the poly-silicon core pellicle. The UTS of ZrSi₂ and MoSi₂ are 6.5 GPa and 10 GPa, respectively, which are significantly higher than the UTS of 1.3 GPa of poly-silicon [5][6]. This means that metal-silicide pellicles made from ZrSi₂ or MoSi₂ are more resistant to mechanical stress and can withstand greater forces before breaking than poly-silicon pellicles.…”
Section: Thermal Stress For Different Structuresmentioning
confidence: 93%
“…In contrast to the temperature trends observed for the pellicle structure, the overall thermal stress of the metal-silicide core pellicle is higher than that of the poly-silicon core pellicle. The UTS of ZrSi₂ and MoSi₂ are 6.5 GPa and 10 GPa, respectively, which are significantly higher than the UTS of 1.3 GPa of poly-silicon [5][6]. This means that metal-silicide pellicles made from ZrSi₂ or MoSi₂ are more resistant to mechanical stress and can withstand greater forces before breaking than poly-silicon pellicles.…”
Section: Thermal Stress For Different Structuresmentioning
confidence: 93%