Functional surfaces with broad-band
ultralow optical reflection
have many potential applications in areas like national defense and
energy conversion. For efficient, high-quality manufacturing of material
surfaces with antireflection features, a novel machining method for
multiscale micro–nano structures is proposed. This method can
enable the collaborative manufacturing of both microstructures via
laser ablation and micro–nano structures with high porosity
via in situ deposition, and it can simplify the fabrication process
of multiscale micro–nano structures. As a result, substantially
improved antireflection properties of the treated material surface
can be realized by optimizing light trapping of the microstructures
and enhancing the effective medium effect for the micro–nano
structures with high porosity. In ultraviolet–visible–near-infrared
regions, average reflectances, as low as 2.21 and 3.33%, are achieved
for Si and Cu surfaces, respectively. Furthermore, the antireflection
effect of the treated surface can also be extended to the mid-infrared
wavelength range, where the average reflectances for the Si and Cu
surfaces decrease to 5.28 and 5.18%, respectively. This novel collaborative
manufacturing method is both simple and adaptable for different materials,
which opens new doors for the preparation of broad-band ultra-low-reflectivity
materials.