Formation of zirconium-titanium solid solutions under the action of compression plasma flows and high-current electron beams

Cherenda, N.N.; Shymanski, V.I.; Углов, В.В.; Асташинский, В. М.; Кузьмицкий, А. М.; Koval, N. N.; Ivanov, Yu. F.; Тересов, А. Д.

doi:10.1134/s2075113312050024

Cited by 8 publications

(3 citation statements)

References 7 publications

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“…One can see that the energy transfer from the capacitor bank to the discharge is terminated at the end of the first current half-period (∼70µs). There are three main direction and application in surface modification of material by CPFs which can be marked out as following: (i) Direct treatment of materials [23][24][25][26], (ii) Mixing of a "coating-substrate" system [19,[27][28][29][30], (iii) Thin film deposition and surface layer alloying by an additional component (e.g., powder) injected into the plasma flow [31][32][33].Plasma beams impinging on solid targets transfer their kinetic energy into both electronic and lattice excitations. Beam energy is converted quickly into atomic motion.…”

Section: Figure 1 (A) Mpc Device and Its Electrods (Anode As 8 Rods mentioning

confidence: 99%

Effect of Compressed Plasma Flow on Tantalum-Titanium Thin Layer Deposited on Silicon Substrate

Sari¹

2014

IJMSA

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Abstract:The interaction of a dense compressed nitrogen plasma flow with a system of Ta-Ti layers on a silicon substrate has been investigated. This plasma flow was generated in a quasi-stationary pulsed plasma accelerator that can provide a supersonic high energy plasma flux. The plasma pulse duration, discharge current, concentration, and energy densities absorbed by the target were 100 µs, 80 kA, 10 18 cm −3 , and 3-13 J/cm 2 respectively. The samples were exposed to a single plasma pulseor to a series of pulses and were characterized by scanning electron microscopy, X-ray diffraction, and energy dispersive X-ray analyses. The result showed that the changes in the elemental and structure phase compositions depends on energy and number of plasma pulses. Formation of Ti 5 Si 3 and Ta 2 N, are the main results of the current research.

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Section: Figure 1 (A) Mpc Device and Its Electrods (Anode As 8 Rods mentioning

confidence: 99%

Effect of Compressed Plasma Flow on Tantalum-Titanium Thin Layer Deposited on Silicon Substrate

Sari¹

2014

IJMSA

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“…Примерами поверхностного легирования являются электровзрывное легирование [11,12] с последующей обработкой импульсным электронным пучком [13][14][15], обработка компрессионными плазменными потоками мишеней с предварительно нанесенными пленками легирующих элементов (алюминий, титан, никель, хром и т.д.) [16][17][18][19]. Такая обработка позволяет получать слои переплава глубиной до 30 мкм и зону теплового воздействия около 200 мкм.…”

Section: Introductionunclassified

Экспериментальные исследования и моделирование импульсного электронно- пучкового воздействия на систему «ZrN-покрытие/подложка из силумина»

Koval¹,

Koval²,

Крысина³

et al. 2022

8th International Congress on Energy Fluxes and Radiation Effects

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Настоящая работа посвящена исследованию комбинированной модификации силумина, включающей нанесение ZrN-покрытия на подложку и последующую обработку импульсным субмиллисекундным электронным пучком системы покрытие/подложка. Были проведены экспериментальные измерения и теоретические расчеты локальной температуры на образцах в зоне электронно-пучкового воздействия и толщины зоны расплава. Численно решена задача Стефана о высокоскоростном нагреве силумина без и с покрытием ZrN под воздействием интенсивного электронно-пучкового воздействия. Получены зависимости температурного поля, положения фронта кристаллизации и скорости его перемещения от времени. Получено, что при изменении толщины покрытия от 0.5 до 2 мкм скорость роста температуры поверхности на фронте увеличивается с 6·107 до 9·107 К/с, а максимальная температура, достигаемая на фронте, изменяется с 760 до 1070 ºС. Глубина расплава не превышает 57 мкм. Скорость фронта расплава в течение импульса воздействия составляет 3·105 мкм/с. Показано хорошее совпадение экспериментальных и теоретических значений температурных характеристик и толщин зон расплава при электронно-пучковой обработке.

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“…Examples of surface alloying are electro-explosive alloying [11,12] followed by pulsed electron beam treatment [13][14][15] and treatment of targets with pre-deposited films of alloying elements (aluminum, titanium, nickel, chromium, etc.) by compression plasma flows [16][17][18][19]. Such treatment produces remelted layers of a depth of up to 30 µm and a heat-affected zone of depth about 200 µm.…”

Section: Introductionmentioning

confidence: 99%

Experimental Study and Mathematical Modeling of the Processes Occurring in ZrN Coating/Silumin Substrate Systems under Pulsed Electron Beam Irradiation

Koval

Крысина

et al. 2021

Coatings

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This paper presents a study of a combined modification of silumin, which included deposition of a ZrN coating on a silumin substrate and subsequent treatment of the coating/substrate system with a submillisecond pulsed electron beam. The local temperature on the samples in the electron-beam-affected zone and the thickness of the melt zone were measured experimentally and calculated using a theoretical model. The Stefan problem was solved numerically for the fast heating of bare and ZrN-coated silumin under intense electron beam irradiation. Time variations of the temperature field, the position of the crystallization front, and the speed of the front movement have been calculated. It was found that when the coating thickness was increased from 0.5 to 2 μm, the surface temperature of the samples increased from 760 to 1070 °C, the rise rate of the surface temperature increased from 6 × 107 to 9 × 107 K/s, and the melt depth was no more than 57 μm. The speed of the melt front during the pulse was 3 × 105 µm/s. Good agreement was observed between the experimental and theoretical values of the temperature characteristics and melt zone thickness.

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Formation of zirconium-titanium solid solutions under the action of compression plasma flows and high-current electron beams

Cited by 8 publications

References 7 publications

Effect of Compressed Plasma Flow on Tantalum-Titanium Thin Layer Deposited on Silicon Substrate

Effect of Compressed Plasma Flow on Tantalum-Titanium Thin Layer Deposited on Silicon Substrate

Экспериментальные исследования и моделирование импульсного электронно- пучкового воздействия на систему «ZrN-покрытие/подложка из силумина»

Experimental Study and Mathematical Modeling of the Processes Occurring in ZrN Coating/Silumin Substrate Systems under Pulsed Electron Beam Irradiation

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