In this work, a comprehensive study on the transition of divacancy (V 2 ) to divacancy-oxygen (V 2 O) pairs in p-type silicon has been performed with deep level transient spectroscopy (DLTS). Czochralski grown, boron doped p-type, silicon samples, with a doping concentration of 2 Â 10 15 cm À3 and oxygen content of 7.0 6 1.5 Â 10 17 cm À3 , have been irradiated with 1.8 MeV protons. Isothermal annealing at temperatures in the range of 200 C-300 C shows a close to one-to-one correlation between the loss in the donor state of V 2 and the formation of the donor state of V 2 O, located at 0.23 eV above the valence band edge. A concurrent transition takes place between the single acceptor states of V 2 and V 2 O, as unveiled by injection of electrons through optical excitation during the trap filling sequence of the DLTS measurements. Applying the theory for diffusion limited reactions, the diffusivity of V 2 in the studied p-type samples is determined to be (1.5 6 0.7) Â 10 À3 exp[À(1.31 6 0.03) eV/kT] cm 2 /s, and this represents the neutral charge state of V 2 . Further, the data seem to favor a two-stage diffusion mechanism involving partial dissociation of V 2 , although a one-stage process cannot be fully excluded. V C 2014 AIP Publishing LLC.