1999
DOI: 10.1016/s0927-0248(99)00057-4
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Formation of porous silicon for large-area silicon solar cells: A new method

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Cited by 44 publications
(17 citation statements)
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“…They have been developed to produce porous silicon layers as emitters in solar cells, since the use of electrochemical etching was found to yield low conversion efficiencies. 232,354 Vapor etching was also investigated to address the difficulty of isolating metal contacts of devices from the electrolyte solution in anodic etching. 355 Spark erosion was tested for preparing porous Si as well.…”
Section: Summarizing General Considerationsmentioning
confidence: 99%
“…They have been developed to produce porous silicon layers as emitters in solar cells, since the use of electrochemical etching was found to yield low conversion efficiencies. 232,354 Vapor etching was also investigated to address the difficulty of isolating metal contacts of devices from the electrolyte solution in anodic etching. 355 Spark erosion was tested for preparing porous Si as well.…”
Section: Summarizing General Considerationsmentioning
confidence: 99%
“…In contrast, no significant differences (Fig. 3) were noticed between VE-based p-and p +-type PS (Saadoun et al 1999); both p-and p +-type PS were found to be mesoporous and formed with interconnected cluster-like structures with sizes roughly ranging from 20 to 50 nm. The p +-type PS presents a more disordered morphology (Fig.…”
Section: Equipment and Processingmentioning
confidence: 82%
“…From TEM and HRTEM (Fig. 4a, b), one may notice that the clusters forming PS consist of small Si particles, having size dimensions less than 5 nm and having different crystallographic orientations and embedded in an amorphous phase (Saadoun et al 1999). (Saadoun et al 1999), (d) p + type, (e) n type, and (f) n + type…”
Section: Equipment and Processingmentioning
confidence: 99%
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“…HNO 3 /HF mixtures were applied in wet chemical etching of silicon [2] for the removal of sawing damage as well as in various steps for silicon solar cells production. HF and HNO 3 /HF based solutions have been also used for spray etching [3] and vapor etching (VE) silicon [4], respectively. The latter techniques were found to be efficient for the production of homogeneous and reproducible porous silicon (PS) layers on the emitter of silicon solar cells, as compared to conventional etching techniques (stain etching or electrochemical etching) that found to yield low conversion efficiency due the aggressiveness of these methods.…”
Section: Introductionmentioning
confidence: 99%