Formation of Nanospheres and Nanorods of Titanium Dioxide in a Low-pressure Ar/O2 Plasma Controlled by a Sputtering Method

Generation Control of ZnO Nanoparticles Using a Coaxial Gas-Flow Pulse Plasma Ar/O2 Plasma

“…This result showed that the nanoparticles were arrived at the substrate after the background layer formation. This meant that the nanoparticles were produced in a space of plasma and grew during their levitation in the discharge [12][13][14]. It was well known that the nanoparticles were able to be negatively charged by the electrons and were levitating near the sheath edge in front of the wall.…”

“…In general, ZnO nanorods and nanoparticles have been produced by vapor-liquid-solid (VLS) process, chemical vapor deposition (CVD), and liquid laser melting method. Our group is focusing on a plasma process for the growth of oxide metal nanostructures [10][11][12][13][14]. This process is superior to the other processes for low temperature and large area deposition.…”

“…In this study, the formation of ZnO nanoparticles was investigated by focusing on its dependence on the discharge parameters such as applied pulse voltage (−500 to −800 V) and total gas flow rate of Ar/O 2 (20 to 100 sccm) under the fixed total pressure (30 Pa) of working gases of Ar and O 2 . Figure 1 shows a schematic of the experimental apparatus [14]. The experiment was performed in low-pressure plasma by employing reactive ion sputtering.…”